A Broadband Model of Stacking TSV Channels for Nondestructive Defect Localization in 3D ICs and Microsystem

被引:2
作者
Qu, Chenbing [1 ]
Wang, Liwei [1 ]
Chen, Si [1 ]
Sun, Chen [1 ]
Fu, Zhiwei [1 ]
Feng, Guan-Lin [2 ]
机构
[1] China Elect Prod Reliabil & Environm Testing Res, Sci & Technol Reliabil Phys & Applicat Elect Comp, Guangzhou, Peoples R China
[2] China Elect Prod Reliabil & Environm Testing Res, Guangzhou, Peoples R China
来源
2021 22ND INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY, ICEPT | 2021年
基金
中国国家自然科学基金;
关键词
3D IC; through silicon via; nondestructive defect localization; equivalent circuit model; signal integration; THROUGH-SILICON VIAS;
D O I
10.1109/ICEPT52650.2021.9568190
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The defect localization is a key link and bottleneck for the failure analysis of 3D interconnects. This paper proposes a combined-cylindrical-shape defect model for the nondestructive defects testing and fault localization of TSV channels in 3D stacked dies. The TSV equivalent circuits and defective fault equivalent circuit are established to explain the fault principle. A simple scheme of GSG TSV channels is made, and their simulated results are shown with the frequency from 100MHz to 20GHz. By fitting the S-parameters of defect TSV chain, the open-circuit defect size and the defect module localization are estimated based on signal integration. The scalable defect localization method is used for multiple stacked dies scheme based on silicon substate.
引用
收藏
页数:4
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