Natural rubber-based pressure-sensitive adhesive films

被引:0
作者
Sarilak, Dusitporn [1 ]
Marom, Thitapha [1 ,2 ]
Wiroonpochit, Panithi [3 ]
Chisti, Yusuf [1 ,4 ]
Hansupalak, Nanthiya [1 ,2 ,5 ]
机构
[1] Kasetsart Univ, Fac Engn, Dept Chem Engn, Bangkok 10900, Thailand
[2] Kasetsart Univ, Fac Engn, Ctr Excellence Petrochem & Mat Technol, Dept Chem Engn, Bangkok 10900, Thailand
[3] Natl Met & Mat Technol Ctr, 111 Phahonyothin Rd, Khlong Luang 12120, Pathum Thani, Thailand
[4] Univ Malaysia Terengganu, Inst Trop Aquaculture & Fisheries, Kuala Nerus 21030, Terengganu, Malaysia
[5] Kasetsart Univ, Fac Sci, Specialized Ctr Rubber & Polymer Mat Agr & Ind, Bangkok 10900, Thailand
关键词
Natural rubber; Rubber photooxidation; Pressure-sensitive adhesive; Ultraviolet light-initiated crosslinking; SULFUR-FREE PREVULCANIZATION; MOLECULAR-WEIGHT; SINGLET OXYGEN; LINKING; LATEX;
D O I
10.1016/j.porgcoat.2025.109510
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
Pressure-sensitive adhesive (PSA) films were prepared from natural rubber using ultraviolet (UV) light-mediated crosslinking of the rubber molecules. Effects of the UV irradiation time, the amounts of the crosslinking agent (1,6-hexanediol diacrylate; HDDA), and the photoinitiator (2-hydroxy-2-methylpropiophenone; Irgacure1173) on the properties of PSA films are reported. Adhesive performance (tack and peel), crosslink density, and mechanical properties (tensile strength, elongation at break, and moduli) of the films depended on the specifics of preparation. UV irradiation simultaneously promoted crosslinking within the rubber matrix and degradation of the surface molecules via photooxidation. HDDA and Irgacure1173 accelerated these processes due to their carbonyl groups facilitating the conversion of molecular oxygen to highly reactive singlet oxygen. The chain degradation reduced molecular weight, enhanced wettability, and improved adhesion, although excessive degradation weakened cohesion. Films with an optimal balance of properties were produced using 120 min UV irradiation time, and equal concentrations (2 phr each) of HDDA and Irgacure1173. With this combination, both the adhesive strength and the cohesive strength were maximized. Thus, the PSA film properties could be tuned by adjusting the preparation conditions, potentially expanding their envelope of applications.
引用
收藏
页数:8
相关论文
共 33 条
[21]  
Puyathorn Napaphol, 2023, Materials Today: Proceedings, P9, DOI 10.1016/j.matpr.2022.10.096
[22]   SINGLET OXYGEN AND FREE-RADICAL OXIDATION OF POLYDIENES AND RELATED PROBLEMS WITH STABILIZATION - SYNERGISTIC AND ANTAGONISTIC EFFECTS [J].
RABEK, JF ;
RANBY, B ;
ARCT, J ;
LIU, RX .
JOURNAL OF PHOTOCHEMISTRY, 1984, 25 (2-4) :519-536
[23]   UV treatment of synthetic styrene-butadiene-styrene rubber [J].
Romero-Sánchez, MD ;
Pastor-Blas, MM ;
Martín-Martínez, JM ;
Walzak, MJ .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2003, 17 (01) :25-45
[24]   THE PHOTODEGRADATION OF CIS-1,4-POLYBUTADIENE, POLYSTYRENEBUTADIENE AND POLYISOPRENE [J].
SARHAN, AA ;
ABDELRAZIK, EA ;
ABDELBARY, EM .
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 1987, 41 (01) :127-139
[25]  
Satas D., 1989, Handbook of pressure sensitive adhesive technology
[26]  
Sigma-Aldrich, Safety data sheet
[27]   Characterization of sol and gel in Hevea natural rubber [J].
Tangpakdee, J ;
Tanaka, Y .
RUBBER CHEMISTRY AND TECHNOLOGY, 1997, 70 (05) :707-713
[28]   Photochemical reduction of molecular weight and number of double bonds in natural rubber film [J].
Tasakorn, Pienpak ;
Amatyakul, Wannipha .
KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2008, 25 (06) :1532-1538
[29]   A novel preparation of natural rubber films with a conducting nanocarbon network for antistatic applications [J].
Wiroonpochit, Panithi ;
Keawmaungkom, Sutthinee ;
Chisti, Yusuf ;
Hansupalak, Nanthiya .
MATERIALS TODAY COMMUNICATIONS, 2023, 34
[30]   Compositing prevulcanized natural rubber with multiwalled carbon nanotubes to make antistatic films [J].
Wiroonpochit, Panithi ;
Keawmaungkom, Sutthinee ;
Chisti, Yusuf ;
Hansupalak, Nanthiya .
POLYMERS FOR ADVANCED TECHNOLOGIES, 2022, 33 (05) :1591-1605