Motion-precision control in bonnet-polishing

被引:8
作者
Wang, Fei [1 ]
Zhang, Jian [1 ]
Peng, Li-Rong [1 ]
Wang, Gao-Wen [1 ]
Sui, Yong-Xin [1 ]
机构
[1] State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun
来源
Guangxue Jingmi Gongcheng/Optics and Precision Engineering | 2015年 / 23卷 / 08期
关键词
Bonnet polishing; Flat polishing; Motion precision; Optical manufacture; Sphere polishing;
D O I
10.3788/OPE.20152308.2220
中图分类号
学科分类号
摘要
To meet the ultra-high precision manufacture demands of spherical surfaces and aspherical surfaces in an optical system of Deep Ultra Violet (DUV) and Extreme Ultra Violet (EUV), a series of motion-precision control methods in bonnet-polishing were proposed. Firstly, the temperatures of main operation units were finely controlled to allow the motion-precision of polishing to be to 50 μm. Then, the coordinates transmitting method was used to guarantee the two-dimension unity between measured data and operating data to be 0.30-0.70 mm. Furthermore, the convergence efficiency of surface-error in fine polishing was improved by bonnet removal estimation method and feedback correction method. Finally, the vertical position accuracy between bonnet and work piece was improved to 10 μm by probing-correction method. The experiment results on a actual polishing by using motion-precision control methods indicate that the surface machining accuracy is 0.8 nm (RMS) in polishing a flat with a diameter of 280 mm, and that is 1.1 nm (RMS) in polishing a concave with a diameter of 160 mm. The proposed methods realize ultra-high precision polishing for spherical surfaces and aspherical surfaces, and they are also suitable for other contact small tool computer controlled polishing. ©, 2015, Chinese Academy of Sciences. All right reserved.
引用
收藏
页码:2220 / 2228
页数:8
相关论文
共 29 条
[1]  
Shi T., Yang Y.Y., Zhang L., Et al., Surface testing methods of aspheric optical elements, Chinese Optics, 7, 1, pp. 26-46, (2014)
[2]  
Li R.G., Zheng L.G., Zhang F., Et al., Computer controlled manufacturing during fine grinding stage of highly steep off-axis asphere with large aperture, Opt. Precision Eng., 15, 5, pp. 633-639, (2007)
[3]  
Wang X.K., Wang L.H., Deng W.J., Et al., Measurement of large aspheric mirrors by non-null testing, Opt. Precision Eng., 19, 3, pp. 520-528, (2011)
[4]  
Kerkhof M., Full optical column characterization of DUV lithographic projection tools, Proc. of SPIE, 5377, pp. 1960-1970, (2004)
[5]  
Kameyama M., Immersion and 32 nm lithography: Now and future, Proc. of SPIE, 6724, (2007)
[6]  
Weiser M., Ion beam figuring for lithography optics, Nuclear Instruments and Methods in Physics Research B, 269, 8-9, pp. 1390-1393, (2009)
[7]  
Garreis R., Catadioptric optics enabling ultra-high NA lithography, pp. 34-35, (2006)
[8]  
Yang L., Modern Optical Manufacturing Engineering, (2008)
[9]  
Zeiss C., Very high aperture projection objective, US: 7339743, (2005)
[10]  
Jones R.A., Rapid optical fabrication with computer-controlled optical surfacing, Opt. Eng., 30, 11, pp. 1962-1969, (1991)