The role of boron in interactions between liquid Si,B alloy and SiC at high temperature: Contribution of Raman spectroscopy, electron energy loss spectroscopy (EELS) and atom probe tomography (APT)

被引:0
作者
Chollon, Georges [1 ]
Plaisantin, Herve [1 ,2 ]
Roger, Jerome [1 ]
Danet, Julien [1 ]
Lopez-Ferber, David [1 ]
Cadel, Emmanuel [3 ]
机构
[1] Univ Bordeaux, Lab Compos Thermostructuraux LCTS, CNRS, UMR 5801,Safran Ceram,CEA, 3 Allee La Boetie, F-33600 Pessac, France
[2] Safran Ceram, 105 Ave Marcel Dassault, F-33700 Merignac, France
[3] Univ Rouen, Grp Phys Mat GPM, CNRS, INSA Rouen,UMR 6634, Ave Univ, F-76800 St Etienne Du Rouvray, France
关键词
Silicon carbide; Silicon; Boron; Electron energy loss spectroscopy; Atom probe tomography; GRAIN-BOUNDARIES; SILICON-CARBIDE; LOCALIZED VIBRATIONS; SCATTERING; SEGREGATION; COMPOSITES; SCALE; PRECIPITATION; CRYSTALS; CARBON;
D O I
10.1016/j.corsci.2025.113075
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This study examines the protective role of boron towards chemical vapor deposited (CVD) SiC via the synthesis and analysis, at various scales, of model composites representative of SiC/SiC composites prepared by silicon melt infiltration. Comparing the SiC-Si,B and SiC-Si model composites clearly demonstrates the boron's protective effect. Yet, the SiC-Si,B sample shows a macroscopic reactivity gradient related to the progression of the Si,B alloy through the porous SiC network. Electron energy loss spectroscopy (EELS) and atom probe tomography (APT) were used to assess elemental composition at the quasi-atomic and trace scales, in the different phases and at SiC/Si,B interfaces. Boron diffuses into bulk SiC, in agreement with thermodynamic calculations, but also concentrates at structural defects in polycrystalline CVD SiC. EELS and APT both revealed a high boron overconcentration over a few nanometers at SiC/Si,B interfaces, without intermediate layer visible by TEM. Raman spectroscopy also evidenced a microscale gradient of substituted boron in the Si,B alloy, near SiC/Si,B interfaces, which was related to a high carbon concentration and an unexpected carbon environment. These results led to conclude that the addition of boron cumulates three beneficial effects limiting SiC reactivity: (1) a volume effect in SiC, stabilizing and accommodating structural defects (2) an interfacial effect, with B atoms concentrating and stabilizing SiC/Si,B interfaces, and (3) a volume effect in the Si,B alloy, forming B-C clusters inhibiting carbon diffusion. Further RMS, EELS and APT analyses at different locations in the model composites would be useful to explain the macroscopic corrosion gradient.
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页数:14
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共 110 条
[1]   THERMO-CALC & DICTRA, computational tools for materials science [J].
Andersson, JO ;
Helander, T ;
Höglund, LH ;
Shi, PF ;
Sundman, B .
CALPHAD-COMPUTER COUPLING OF PHASE DIAGRAMS AND THERMOCHEMISTRY, 2002, 26 (02) :273-312
[2]  
[Anonymous], 2007, Computational thermodynamics: The Calphad Method
[3]   Extending the analysis of EELS spectrum-imaging data, from elemental to bond mapping in complex nanostructures [J].
Arenal, R. ;
de la Pena, F. ;
Stephan, O. ;
Walls, M. ;
Tence, M. ;
Loiseau, A. ;
Colliex, C. .
ULTRAMICROSCOPY, 2008, 109 (01) :32-38
[4]   Association of broad icosahedral Raman bands with substitutional disorder in SiB3 and boron carbide [J].
Aselage, TL ;
Tallant, DR .
PHYSICAL REVIEW B, 1998, 57 (05) :2675-2678
[5]   The coexistence of silicon borides with boron-saturated silicon:: Metastability of SiB3 [J].
Aselage, TL .
JOURNAL OF MATERIALS RESEARCH, 1998, 13 (07) :1786-1794
[6]   Spectral Dependence of Optical Absorption of 4H-SiC Doped with Boron and Aluminum [J].
Atabaev, I. G. ;
Juraev, Kh. N. ;
Hajiev, M. U. .
JOURNAL OF SPECTROSCOPY, 2018, 2018
[7]   First principles analysis of impurities in silicon carbide grain boundaries [J].
Atkinson, Cassidy M. ;
Guziewski, Matthew C. ;
Coleman, Shawn P. ;
Nayak, Sanjeev K. ;
Alpay, S. Pamir .
ACTA MATERIALIA, 2021, 221
[8]   CURRENT TRENDS FOR EELS STUDIES IN PHYSICS [J].
BATSON, PE .
MICROSCOPY MICROANALYSIS MICROSTRUCTURES, 1991, 2 (2-3) :395-402
[9]   The corrosion behavior of various CVD SiC coatings in molten silicon [J].
Berdoyes, I. ;
Plaisantin, H. ;
Danet, J. ;
Lepetitcorps, Y. ;
Roger, J. .
CERAMICS INTERNATIONAL, 2024, 50 (02) :3877-3886
[10]   Three-dimensional atomic-scale imaging of impurity segregation to line defects [J].
Blavette, D ;
Cadel, E ;
Fraczkiewicz, A ;
Menand, A .
SCIENCE, 1999, 286 (5448) :2317-2319