CMOS-Compatible Protonic Three-Terminal Memristor for Analog Synapse in Neuromorphic Computing

被引:0
作者
Liu, Lingli [1 ]
Dananjaya, Putu Andhita [1 ]
Koh, Eng Kang [1 ]
Tan, Funan [1 ]
Chen, Ze [1 ]
Lim, Gerard Joseph [1 ]
Lee, Calvin Xiu Xian [1 ]
Yang, Jin-Lin [1 ]
Lew, Wen Siang [1 ]
机构
[1] Nanyang Technol Univ, Sch Phys & Math Sci, Singapore 637371, Singapore
关键词
hydrogen plasma; memristor; protonic; synaptic device; three-terminal; THIN-FILMS; DIFFUSION-COEFFICIENT; HYDROGEN; OXIDE; ELECTROLYTE; DEVICES;
D O I
10.1002/smtd.202500445
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
All-solid-state inorganic hydrogen-based three-terminal memristors (H-3TMs) suffer from poor retention, susceptibility to humidity and temperature, and the reliance on wet chemistry during fabrication, hindering their manufacturability within existing foundry processes. To address these, this study presents a CMOS-compatible H-3TM based on reversible intercalation and extraction of protons between the SiNx electrolyte and WOx channel. The protons are introduced via a straightforward hydrogen plasma treatment, promoting a compatible fabrication process with back-end-of-line integration. Experimental and simulation results indicate that the low proton transport tendency across the electrolyte/channel interface without an external electric field contributes to high retention performance. Furthermore, the device demonstrates linear potentiation and depression, 512 conductance states with a dynamic range of approximate to 40, low energy operation (approximate to 73 fJ per write), and excellent overall device-to-device variation. Its analog properties are evaluated under the training and inference framework of MNIST and Fashion-MNIST datasets. The device achieved training and inference accuracies only 0.4% and 0.3% below the ideal benchmark on the F-MNIST dataset. This work offers a rational approach for future artificial synaptic device design and fabrication.
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页数:10
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