Observation of unusual stacking in plasma sprayed exfoliated MoS2

被引:0
作者
Kiran, P. Sai [1 ]
Kumar, K. Vijay [1 ]
Pandit, Niranjan [1 ]
Satish, Chintham [1 ]
Keshri, Anup Kumar [1 ]
机构
[1] Indian Inst Technol Patna, Plasma Spray Coating Lab, Met & Mat Engn, Patna 801106, Bihar, India
关键词
MoS2; twisted MoS 2; Plasma spray; Twist angle; Electrochemical performance; SUPERCONDUCTIVITY;
D O I
10.1016/j.apsusc.2025.163127
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Twisted 2D TMDs with misorientation of layers have sparked utmost attention towards probing into an escalating new classification of materials with tuned materials characteristics. Yet, research on the scaling up of synthesis protocols and their electrochemical performance remains in its infancy. Herein, we present the first report on the observation of twisting angles (0 = 6.4 degrees, 8.1 degrees, 11.4 degrees, 19 degrees, 20.4 degrees, 22 degrees and 26 degrees) in plasma sprayed exfoliated twisted MoS2. Raman spectroscopy analysis revealed the induced twist angles in exfoliated MoS2. Further, HR TEM investigation confirms the existence of twisting with significant moire<acute accent> pattern in exfoliated MoS2 layers and corroborates with Raman spectra findings. Twisted MoS2 layers exhibited better electrochemical performance of 181F/g than bulk MoS2. This breakthrough observation paves the way to unveil the industrially friendly plasma spraying protocol for the synthesis of other and upcoming twisted 2D materials.
引用
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页数:7
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