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Performance Improvement of Vertical Channel Indium-Gallium-Zinc Oxide Thin-Film Transistors Using Porous MXene Electrode
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作者:

Fu, Wanqiang
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Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

Chen, Qizhen
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Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

Gao, Peng
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Chinese Acad Sci, Fujian Inst Res Struct Matter, CAS Key Lab Design & Assembly Funct Nanostruct, Fuzhou 350002, Peoples R China
Chinese Acad Sci, Fujian Inst Res Struct Matter, Fujian Prov Key Lab Nanomat, Fuzhou 350002, Peoples R China Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

Jiang, Linqin
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Fujian Jiangxia Univ, Key Lab Green Perovskites Applicat Fujian Prov Uni, Fuzhou 350108, Peoples R China Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

Qiu, Yu
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Fujian Jiangxia Univ, Key Lab Green Perovskites Applicat Fujian Prov Uni, Fuzhou 350108, Peoples R China Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

Wuu, Dong-Sing
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Natl Chi Nan Univ, Dept Appl Mat & Optoelect Engn, Nantou 54561, Taiwan Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

Horng, Ray-Hua
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Natl Yang Ming Chiao Tung Univ, Inst Elect, Hsinchu 30010, Taiwan Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China

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机构:
[1] Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China
[2] Chinese Acad Sci, Fujian Inst Res Struct Matter, CAS Key Lab Design & Assembly Funct Nanostruct, Fuzhou 350002, Peoples R China
[3] Chinese Acad Sci, Fujian Inst Res Struct Matter, Fujian Prov Key Lab Nanomat, Fuzhou 350002, Peoples R China
[4] Fujian Jiangxia Univ, Key Lab Green Perovskites Applicat Fujian Prov Uni, Fuzhou 350108, Peoples R China
[5] Natl Chi Nan Univ, Dept Appl Mat & Optoelect Engn, Nantou 54561, Taiwan
[6] Natl Yang Ming Chiao Tung Univ, Inst Elect, Hsinchu 30010, Taiwan
[7] Da Yeh Univ, Dept Mat Sci & Engn, Dacun 51591, Taiwan
来源:
基金:
中国国家自然科学基金;
关键词:
MXene;
IGZO;
vertical channel TFT;
porous source electrode;
flexible devices;
D O I:
10.3390/en18092331
中图分类号:
TE [石油、天然气工业];
TK [能源与动力工程];
学科分类号:
0807 ;
0820 ;
摘要:
The surface morphology of porous source electrodes plays a significant role in the performance of vertical channel indium-gallium-zinc oxide thin-film transistors (VC-IGZO-TFTs). This study systematically investigates the properties of porous MXene-based source electrodes and their impact on VC-IGZO-TFTs fabricated with varying MXene concentrations. As the MXene concentration increases, both the sheet resistance and porosity of the electrodes decrease. VC-IGZO-TFTs based on a 3.0 mg/mL MXene concentration exhibit optimal electrical performance, with a threshold voltage (Vth) of 0.16 V, a subthreshold swing (SS) of 0.20 V/decade, and an on/off current ratio (Ion/Ioff) of 4.90 x 105. Meanwhile, the VC-IGZO-TFTs exhibit excellent electrical reliability and mechanical stability. This work provides a way to analyze the influence of sheet resistance and porosity on the performance of VC-IGZO-TFTs, offering a viable approach for enhancing device efficiency through porous MXene electrode engineering.
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Hanyang Univ, Dept Fus Chem Engn, Ansan 15588, South Korea Hanyang Univ, Dept Fus Chem Engn, Ansan 15588, South Korea
[10]
Comparative analysis on negative-bias-illumination-stress instabilities between planar- and vertical-channel thin-film transistors using InGaZnO active channels prepared by atomic-layer deposition
[J].
Kang, Ji -Won
;
Lee, Dong-Hee
;
Kwon, Young-Ha
;
Seong, Nak-Jin
;
Choi, Kyu-Jeong
;
Hwang, Chi-Sun
;
Yoon, Sung-Min
.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,
2024, 181

Kang, Ji -Won
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Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea

Lee, Dong-Hee
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Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea

Kwon, Young-Ha
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NCD Co Ltd, Daejeon 34015, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea

Seong, Nak-Jin
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NCD Co Ltd, Daejeon 34015, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea

Choi, Kyu-Jeong
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NCD Co Ltd, Daejeon 34015, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea

Hwang, Chi-Sun
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机构:
Elect & Telecommun Res Inst, Daejeon, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea

Yoon, Sung-Min
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机构:
Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi Do, South Korea