Performance Improvement of Vertical Channel Indium-Gallium-Zinc Oxide Thin-Film Transistors Using Porous MXene Electrode

被引:0
作者
Fu, Wanqiang [1 ]
Chen, Qizhen [1 ]
Gao, Peng [2 ,3 ]
Jiang, Linqin [4 ]
Qiu, Yu [4 ]
Wuu, Dong-Sing [5 ]
Horng, Ray-Hua [6 ]
Lien, Shui-Yang [1 ,7 ]
机构
[1] Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China
[2] Chinese Acad Sci, Fujian Inst Res Struct Matter, CAS Key Lab Design & Assembly Funct Nanostruct, Fuzhou 350002, Peoples R China
[3] Chinese Acad Sci, Fujian Inst Res Struct Matter, Fujian Prov Key Lab Nanomat, Fuzhou 350002, Peoples R China
[4] Fujian Jiangxia Univ, Key Lab Green Perovskites Applicat Fujian Prov Uni, Fuzhou 350108, Peoples R China
[5] Natl Chi Nan Univ, Dept Appl Mat & Optoelect Engn, Nantou 54561, Taiwan
[6] Natl Yang Ming Chiao Tung Univ, Inst Elect, Hsinchu 30010, Taiwan
[7] Da Yeh Univ, Dept Mat Sci & Engn, Dacun 51591, Taiwan
基金
中国国家自然科学基金;
关键词
MXene; IGZO; vertical channel TFT; porous source electrode; flexible devices;
D O I
10.3390/en18092331
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The surface morphology of porous source electrodes plays a significant role in the performance of vertical channel indium-gallium-zinc oxide thin-film transistors (VC-IGZO-TFTs). This study systematically investigates the properties of porous MXene-based source electrodes and their impact on VC-IGZO-TFTs fabricated with varying MXene concentrations. As the MXene concentration increases, both the sheet resistance and porosity of the electrodes decrease. VC-IGZO-TFTs based on a 3.0 mg/mL MXene concentration exhibit optimal electrical performance, with a threshold voltage (Vth) of 0.16 V, a subthreshold swing (SS) of 0.20 V/decade, and an on/off current ratio (Ion/Ioff) of 4.90 x 105. Meanwhile, the VC-IGZO-TFTs exhibit excellent electrical reliability and mechanical stability. This work provides a way to analyze the influence of sheet resistance and porosity on the performance of VC-IGZO-TFTs, offering a viable approach for enhancing device efficiency through porous MXene electrode engineering.
引用
收藏
页数:11
相关论文
共 26 条
[1]   Geometrical and Structural Design Schemes for Trench-Shaped Vertical Channel Transistors Using Atomic-Layer Deposited n-Ga-Zn-O [J].
Ahn, Hyun-Min ;
Moon, Seo-Hyun ;
Kwon, Young-Ha ;
Seong, Nak-Jin ;
Choi, Kyu-Jeong ;
Hwang, Chi-Sun ;
Yang, Jong-Heon ;
Kim, Yong-Hae ;
Yoon, Sung-Min .
IEEE ELECTRON DEVICE LETTERS, 2022, 43 (11) :1909-1912
[2]   Impact of Strategic Approaches for Improving the Device Performance of Mesa-shaped Nanoscale Vertical-Channel Thin-Film Transistors Using Atomic-Layer Deposited In-Ga-Zn-O Channel Layers [J].
Ahn, Hyun-Min ;
Kwon, Young-Ha ;
Seong, Nak-Jin ;
Choi, Kyu-Jeong ;
Hwang, Chi-Sun ;
Yoon, Sung-Min .
ELECTRONIC MATERIALS LETTERS, 2022, 18 (03) :294-303
[3]   Vertical oxide thin-film transistor with interfacial oxidation [J].
Baek, Yeong Jo ;
Kang, In Hye ;
Hwang, Sang Ho ;
Han, Ye Lin ;
Kang, Min Su ;
Kang, Seok Jun ;
Kim, Seo Gwon ;
Woo, Jae Geun ;
Yu, Eun Seong ;
Seong, Byung .
SCIENTIFIC REPORTS, 2022, 12 (01)
[4]   Amorphous silicon thin-film transistors with 90° vertical nanoscale channel -: art. no. 253501 [J].
Chan, I ;
Nathan, A .
APPLIED PHYSICS LETTERS, 2005, 86 (25) :1-3
[5]   Investigation of Asymmetric Characteristics of Novel Vertical Channel-All-Around (CAA) In-Ga-Zn-O Field Effect Transistors [J].
Chen, Qian ;
Wang, Lingfei ;
Duan, Xinlv ;
Guo, Jingrui ;
Wang, Zhaogui ;
Huang, Kailiang ;
Feng, Junxiao ;
Sun, Ying ;
Jiao, Guangfan ;
Jing, Weiliang ;
Geng, Di ;
Li, Ling .
IEEE ELECTRON DEVICE LETTERS, 2022, 43 (06) :894-897
[6]   Implementation of In-Ga-Zn-O Thin-Film Transistors with Vertical Channel Structures Designed with Atomic-Layer Deposition and Silicon Spacer Steps [J].
Choi, Se-Na ;
Yoon, Sung-Min .
ELECTRONIC MATERIALS LETTERS, 2021, 17 (06) :485-492
[7]   High-Performance All-Solution-Processed Flexible Photodetector Arrays Based on Ultrashort Channel Amorphous Oxide Semiconductor Transistors [J].
Han, Guoqiang ;
Cao, Shuguang ;
Yang, Qian ;
Yang, Wenyu ;
Guo, Tailiang ;
Chen, Huipeng .
ACS APPLIED MATERIALS & INTERFACES, 2018, 10 (47) :40631-40640
[8]   Highly hydrophilic electrodeposited NiS/Ni3S2 interlaced nanosheets with surface-enriched Ni3+sites as binder-free flexible cathodes for high-rate hybrid supercapacitors [J].
Hsu, Yu-Kai ;
Mondal, Aniruddha ;
Su, Ying-Zhou ;
Sofer, Zdenek ;
Anuratha, Krishnan Shanmugam ;
Lin, Jeng-Yu .
APPLIED SURFACE SCIENCE, 2022, 579
[9]   A noble gas sensor platform: linear dense assemblies of single-walled carbon nanotubes (LACNTs) in a multi-layered ceramic/metal electrode system (MLES) [J].
Hwang, Tae-Yeon ;
Choi, Yomin ;
Song, YoSeb ;
Eom, Nu Si A. ;
Kim, Seil ;
Cho, Hong-Baek ;
Myung, Nosang V. ;
Choa, Yong-Ho .
JOURNAL OF MATERIALS CHEMISTRY C, 2018, 6 (05) :972-979
[10]   Comparative analysis on negative-bias-illumination-stress instabilities between planar- and vertical-channel thin-film transistors using InGaZnO active channels prepared by atomic-layer deposition [J].
Kang, Ji -Won ;
Lee, Dong-Hee ;
Kwon, Young-Ha ;
Seong, Nak-Jin ;
Choi, Kyu-Jeong ;
Hwang, Chi-Sun ;
Yoon, Sung-Min .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2024, 181