Thermodynamic Modeling of Phase-Formation Conditions in the Si-O-C-H-He and Si-O-C-H-N-He Systems

Thermodynamic modeling of film synthesis from the vapor phase in the Si-O-C-H-He and Si-O-C-H-N-He systems involving the decomposition of hexamethyldisiloxane (HMDSO) was performed. The calculation of chemical equilibria used in the modeling involved the minimization of the Gibbs energy of the system, implemented using the electronic materials database (EMDB). It was shown that various phase complexes containing silicon oxide, silicon carbide, and silicon nitride can be produced by CVD processes of these systems. The results of the thermodynamic modeling can be useful for developing methods for the synthesis of film coatings based on these phase complexes.