Alignment teaching assisted fully automated mechanical dicing of MEMS and NEMS devices

被引:0
作者
Mahmood, Muhammad Rashid [1 ,3 ]
Griesmann, Jens [2 ]
Chervenkov, Sotir [2 ]
Yilmaz, Mehmet [3 ]
机构
[1] Bilkent Univ, Inst Mat Sci & Nanotechnol, TR-06800 Ankara, Turkiye
[2] DISCO HiTEC EUROPE GmbH, Liebig Str 8, D-85551 Kirchheim, Germany
[3] Bilkent Univ, Natl Nanotechnol Res Ctr UNAM, TR-06800 Ankara, Turkiye
关键词
diamond blade dicing; MEMS; alignment target; alignment teaching; automated dicing; dicing time; RESIST; EUV;
D O I
10.1088/1361-6439/adc9bb
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In the dynamic landscape of semiconductor manufacturing, the demand for innovative and efficient techniques is ever-growing. Dicing is a singulation process where a machine known as a dicing saw or dicer uses a diamond blade or laser to separate dies from a wafer through a manual, semi-automated, or fully automated process. In diamond blade or mechanical dicing, the dicing saw utilizes a thin blade to cut through a wafer. This paper presents the design and implementation of an alignment teaching-assisted fully automated dicing process for the singulation of microelectromechanical systems (MEMS) devices. A pseudo-MEMS device with potential alignment targets was designed and manufactured by conventional microfabrication techniques. Alignment teaching operation was optimized for the dicing saw by finding the most appropriate alignment targets, as alignment teaching is as a pre-requisite for realizing both auto-alignment and automated dicing processes. A systematic trial-and-error approach was employed to discover the most suitable alignment targets from a pool of twenty-three potential target patterns. A circle was identified as an excellent macro target, while the addition symbol, hash symbol, and rectangle-pair were determined to be the most appropriate micro targets. The developed versatile singulation process is capable of executing an alignment teaching assisted fully automated (i.e. a total of one-click to initiate and finalize) dicing for singulating MEMS device chips, irrespective of alignment target color, die size, or wafer material. Furthermore, we developed, and experimentally validated, a mathematical model to estimate the total process time for the automated dicing.
引用
收藏
页数:17
相关论文
共 30 条
[1]  
[Anonymous], 2016, Alignment Tips and Tricks
[2]   The effect of front pyramid heights on the efficiency of homogeneously textured inline-diffused screen-printed monocrystalline silicon wafer solar cells [J].
Basu, Prabir Kanti ;
Khanna, Ankit ;
Hameiri, Ziv .
RENEWABLE ENERGY, 2015, 78 :590-598
[3]   Surface science, MEMS and NEMS: Progress and opportunities for surface science research performed on, or by, microdevices [J].
Berman, D. ;
Krim, J. .
PROGRESS IN SURFACE SCIENCE, 2013, 88 (02) :171-211
[4]   Singulation for imaging ring arrays of capacitive micromachined ultrasonic transducers [J].
Chang, Chienliu ;
Moini, Azadeh ;
Nikoozadeh, Amin ;
Sarioglu, Ali Fatih ;
Apte, Nikhil ;
Zhuang, Xuefeng ;
Khuri-Yakub, Butrus T. .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2014, 24 (10)
[5]  
Creese R.C., 1992, Estimating and Costing for the Metal Manufacturing Industries
[6]   High carbon fullerene based spin-on organic hardmask [J].
Dawson, Guy ;
Brown, Alan G. ;
McClelland, Alexandra ;
Lada, Tom ;
Montgomery, Warren ;
Robinson, Alex P. G. .
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXV, 2018, 10586
[7]   Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography [J].
Frommhold, A. ;
Yang, D. X. ;
McClelland, A. ;
Xue, X. ;
Ekinci, Y. ;
Palmer, R. E. ;
Robinson, A. P. G. .
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI, 2014, 9051
[8]   EUV lithography performance of negative-tone chemically amplified fullerene resist [J].
Frommhold, A. ;
Yang, D. X. ;
McClelland, A. ;
Xue, X. ;
Palmer, R. E. ;
Robinson, A. P. G. .
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXX, 2013, 8682
[9]   Fullerene-based spin-on-carbon hardmask [J].
Frommhold, A. ;
Manyam, J. ;
Palmer, R. E. ;
Robinson, A. P. G. .
MICROELECTRONIC ENGINEERING, 2012, 98 :552-555
[10]   Novel Molecular Resist for EUV and Electron Beam Lithography [J].
Frommhold, Andreas ;
Yang, Dongxu ;
McClelland, Alexandra ;
Roth, John ;
Xue, Xiang ;
Rosamund, Mark C. ;
Linfield, Edmund H. ;
Robinson, Alex P. G. .
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2015, 28 (04) :537-540