共 10 条
[2]
Horsky TN, 2016, 2016 21ST INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT)
[3]
Multi-Cusp Ion Source for Gen 5.5 Doping System
[J].
ION IMPLANTATION TECHNOLOGY 2012,
2012, 1496
:328-331
[6]
Kuwata Y., P 21 TH INT C ION IM, P213, DOI [10.1109/IIT.2016.7882876, DOI 10.1109/IIT.2016.7882876]
[8]
Wada R., 2019, Jpn. J. Appl. Phys., V59, DOI [10.7567/1347-4065/ab5b6a.2S.Yuanetal.,Proc.o, DOI 10.7567/1347-4065/AB5B6A.2S.YUANETAL.,PROC.O]
[9]
Woo HJ, 2009, AIP CONF PROC, V1099, P535, DOI 10.1063/1.3120092
[10]
Yuan S., 2023, P 21 ST INT WORKSH J, DOI [10.23919/IWJT59028.2023.10175168, DOI 10.23919/IWJT59028.2023.10175168]