Study of Dihedral-Corner-Reflector-Array Fabrication Process Using Soft X-ray Deep X-ray Lithography

被引：0

作者：

Watanabe, Taki ^{[1
]}

Amano, Sho ^{[1
]}

Izawa, Shinya ^{[1
]}

Maekawa, Satoshi ^{[2
]}

Yoshiki, Keisuke

Yamaguchi, Akinobu ^{[1
,3
]}

Utsumi, Yuichi ^{[1
]}

机构：

[1] Univ Hyogo, Lab Adv Sci & Technol Ind, 3-1-2 Kouto, Kamigori, Hyogo 6781205, Japan

[2] Parity Innovat Co Ltd, Kyoto, Japan

[3] Inst Res Promot & Collaborat, Tokyo, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2023年 / 36卷 / 02期

关键词：

Synchrotron radiation; X-ray; LIGA; Microfabrication; DCRA; LIGA;

D O I：

暂无

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

We fabricated sectoral-pillar structures for Dihedral Corner Reflector Array (DCRA) using Deep X-ray Lithography (DXRL) in New SUBARU Synchrotron Radiation Facility. We studied process conditions such as a start timing of development after exposure and development temperature. We succeeded in fabricating a structure without of micro-cracks on sidewalls of the pillar and in demonstration of floating image using the fabricated DCRA.

引用

页码：97 / 100

页数：4

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