A Comparative Study of Property Measurement for Zno-Thin Film Growth Processes Using Hydrocloric Acid (HCl) and Water (H2O) Solution-Dependent on Novel Electrostatic Spray Deposition (ESD)

This investigation has been carried out utilising the innovative ESD technique for six ZnO nano polycrystalline (NP) samples. The Debye-Scherer model (DSD) is used to study the mechanical elastic properties (MEP) as lattice dislocation density (delta) and the lattice strain (epsilon %) contribution to the X-ray diffraction line broadening in nanocrystalline ZnO thin film. The average size of the crystallites was determined to be approximately 48 nm. When studying the phenomenon of line broadening, it is critical to take into account MEP anisotropy. This is necessary in order to effectively distinguish between the influences of strain and particle size. The novel ESD technique promotes ZnO growth mechanisms by adding small amounts of HCl into spray solutions on conductive In2O3:Sn (ITiO)-coated alkali-free glass substrates while changing the water (H2O) ratio. XRD pattern characterisation revealed the preferred orientation of the (002) planes in ZnO thin films. This study represents a significant advancement in the easy understanding of the ZnO growth mechanism and the changes in MEP enabled by ESD-deposited thin film in cost-effective industrial and commercial applications of electronics.