Dual-mode on-machine metrology for SPDT tool alignment

被引:0
|
作者
Kang, Wenjun [1 ]
Wang, Yihan [1 ]
Ma, Hongzhang [1 ]
Wang, Daodang [1 ]
Liang, Rongguang [1 ]
机构
[1] Univ Arizona, Wyant Coll Opt Sci, Tucson, AZ 85721 USA
基金
美国国家科学基金会; 美国国家卫生研究院;
关键词
On-machine metrology; Tool alignment; Dual-mode interferometry; Robust system calibration; Precision fabrication;
D O I
10.1016/j.precisioneng.2024.11.015
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To address the critical demand for on-machine metrology (OMM) in precision optics fabrication, a unique dualmode OMM system has been developed. By integrating polarization-based snapshot motionless phase shifting, this OMM system enables the measurement of both surface form and roughness under laser interferometry mode and LED interference microscopy mode. Its compact and dual-mode design makes it ideal for on-machine tool alignment within single-point diamond turning (SPDT) machines, without the need to remove parts. To enhance its OMM capabilities, a defocus-model-based least square (L2) regression fitting algorithm and a convex-hullbased L2 regression are proposed to achieve precise retrieval of deviations in X and Y axes with robustness. Additionally, a high-precision calibration method for testing system misalignment, based on the Zernike highorder approximation model, is applied to relax the OMM system alignment requirements. As a result, rapid tool alignment is achieved without stringent alignment needs. The proposed OMM eliminates the necessity for offline metrology feedback during the tool alignment process and increases process efficiency by at least 50 %. Furthermore, it eliminates errors caused by removing, repositioning, and rebalancing the part, offering a novel alternative solution to address the critical demand for SPDT tool alignment and surface characterization.
引用
收藏
页码:101 / 110
页数:10
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