Fabrication of Porous SiC Coatings on Quartz Substrates by Laser Chemical Vapor Deposition

被引:0
作者
Yang, Meijun [1 ]
Chen, Rui [2 ]
Xu, Qingfang [1 ]
Guo, Bingjian [2 ]
Liu, Kai [2 ]
Tu, Rong [1 ]
Zhang, Song [1 ]
机构
[1] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
[2] Wuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Peoples R China
基金
对外科技合作项目(国际科技项目); 中国国家自然科学基金;
关键词
laser etching; laser CVD; quartz substrate; SiC coating; CARBIDE THIN-FILMS; TEMPERATURE; GROWTH; CVD;
D O I
10.1007/s11595-025-3068-x
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser etching and laser chemical vapor deposition (LCVD) techniques were proposed for the rapid preparation of high-purity, strongly bonded SiC porous micro-nano-coatings on quartz substrates. The laser serves as an external driving force for the vertical growth of SiC whiskers, facilitating the formation of a porous nanostructure that resembles coral models found in the macroscopic biological world. The porous nanostructures are beneficial for reducing thermal expansion mismatch and relieving residual stress. It is capable of eliminating the cracks on the surface of SiC coatings as well as enhancing the bonding of SiC coatings with quartz substrates to avoid coating detachment.
引用
收藏
页码:330 / 337
页数:8
相关论文
共 50 条
[41]   Thermal barrier coatings produced by chemical vapor deposition [J].
Vargas Garcia, J. R. ;
Goto, Takashi .
SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, 2003, 4 (04) :397-402
[42]   Chemical Vapor Deposition and Atomic Layer Deposition of Coatings for Mechanical Applications [J].
Doll, G. L. ;
Mensah, B. A. ;
Mohseni, H. ;
Scharf, T. W. .
JOURNAL OF THERMAL SPRAY TECHNOLOGY, 2010, 19 (1-2) :510-516
[43]   Preparation of SiOC nanocomposite films by laser chemical vapor deposition [J].
Yu, Shu ;
Tub, Rong ;
Goto, Takashi .
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2016, 36 (03) :403-409
[44]   Chemical vapour deposition of epitaxial rhombohedral BN thin films on SiC substrates [J].
Chubarov, M. ;
Pedersen, H. ;
Hogberg, H. ;
Czigany, Zs. ;
Henry, A. .
CRYSTENGCOMM, 2014, 16 (24) :5430-5436
[45]   Fabrication of tungsten films by metallorganic chemical vapor deposition [J].
Li, Yi ;
Li, Jin-pu ;
Jia, Cheng-chang ;
Liu, Xue-quan .
INTERNATIONAL JOURNAL OF MINERALS METALLURGY AND MATERIALS, 2012, 19 (12) :1149-1153
[46]   FABRICATION OF GaN FILMS IN A CHEMICAL VAPOR DEPOSITION REACTOR [J].
Meng, J. ;
Jaluria, Y. ;
Wong, S. .
PROCEEDINGS OF THE ASME 4TH INTERNATIONAL CONFERENCE ON MICRO/NANOSCALE HEAT AND MASS TRANSFER - 2013, 2014,
[47]   Morphological stability of 6H-SiC epitaxial layer on hemispherical substrates prepared by chemical vapor deposition [J].
Nishino, S ;
Nishio, Y ;
Masuda, Y ;
Chen, Y ;
Jacob, C .
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 :197-200
[48]   Structural analysis of (211) 3C-SiC on (211) Si substrates grown by chemical vapor deposition [J].
Nishiguchi, T ;
Mukai, Y ;
Nakamura, M ;
Nishio, K ;
Isshiki, T ;
Ohshima, S ;
Nishino, S .
SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2, 2004, 457-460 :285-288
[49]   Chemical Vapor Deposition of Porous GaN Particles on Silicon [J].
Carvajal, Joan J. ;
Bilousov, Oleksandr V. ;
Drouin, Dominique ;
Aguilo, Magdalena ;
Diaz, Francesc ;
Rojo, J. Carlos .
MICROSCOPY AND MICROANALYSIS, 2012, 18 (04) :905-911
[50]   Microstructure of SiC-ZrC composite coatings on TRISO particles via fluidized bed chemical vapor deposition [J].
Lee, Hyeon-Geun ;
Kim, Daejong ;
Park, Ji Yeon ;
Kim, Weon-Ju .
CERAMICS INTERNATIONAL, 2019, 45 (18) :24001-24006