X-ray mirror figure correction using differential deposition

被引:0
作者
Morawe, Ch [1 ]
Laboure, S. [1 ]
Perrin, F. [1 ]
Vivo, A. [1 ]
Barrett, R. [1 ]
机构
[1] ESRF, Grenoble, France
来源
ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS XIX | 2024年 / 13150卷
关键词
x-ray optics; x-ray mirrors; differential deposition; figure correction; magnetron sputtering; thin films; Fizeau stitching metrology; SYSTEM;
D O I
10.1117/12.3027938
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The surface figure of x-ray mirrors can be improved by differential deposition of thin films. To achieve the required corrections, WSi2 layers of variable thickness were deposited through beam-defining apertures of different openings. The substrates were moved in front of the particle source with specific velocity profiles that were calculated with a deconvolution algorithm. Two different DC magnetron sputter systems were used to investigate the correction process. Height errors were evaluated before and after each iteration using off-line visible light surface metrology. Four 300 mm long flat Si mirrors were used to study the impact of the initial shape errors on the performance of the correction approach. The shape errors were routinely reduced by a factor of 20-30 down to levels below 0.5 nm RMS.
引用
收藏
页数:10
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