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Interlayer Shear Behaviors of Bilayer Graphene with A Moire Pattern
被引:0
|作者:
Ren, Qiancheng
[1
,2
,3
]
Liu, Jinglan
[4
]
Yang, Qi
[1
,2
,3
]
Zhao, Pei
[1
,2
,3
]
机构:
[1] Key Lab Soft Machines & Smart Devices Zhejiang Pro, Hangzhou 310012, Peoples R China
[2] Zhejiang Univ, Ctr X Mech, Hangzhou 310012, Peoples R China
[3] Zhejiang Univ, Inst Appl Mech, Hangzhou 310012, Peoples R China
[4] Qingdao Univ Technol, Sch Sci, Qingdao 266520, Peoples R China
基金:
美国国家科学基金会;
关键词:
Twisted bilayer graphene;
Moire pattern;
Interfacial damage;
Raman spectroscopy;
Molecular dynamics simulations;
FUNCTIONAL THEORY CALCULATIONS;
MECHANICAL-PROPERTIES;
GROWTH;
SOLITONS;
D O I:
10.1016/j.jmps.2025.106123
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The mechanical behavior of van der Waals (vdW) interfaces under shear is important for micro- nano mechanics. However, due to the diverse structures of vdW interfaces, there is still a lack of systematic and quantitative research. Here we focus on the simplest vdW interface formed by flat carbon rings, construct twisted bilayer graphene (tBLG) with different moire<acute accent> patterns through the twist angle design between lattices, and analyze the interfacial behavior under shear from three aspects of experiment, theory, and molecular dynamics simulations. The interfacial shear strength and stiffness for tBLG with different twist angles are obtained, and more results reveal that although the change in twist angle has little effect on the average interlayer distance, the interlayer interaction changed significantly, and with the evolution of the moire<acute accent> pattern the interlayer damage is still strongly related to the dislocations. This study provides important insights into understanding the interlayer mechanical behavior of vdW interfaces and low- dimensional layered materials.
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页数:10
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