Analysis and Modeling of Self-heating and Substrate-Induced Transitions in 5-nm Stacked Nanosheet FET

被引:0
作者
Singh, Aditya Kumar [1 ]
Kumar, Vivek [1 ,2 ]
Patel, Jyoti [1 ]
Dasgupta, Sudeb [1 ]
机构
[1] Indian Inst Technol Roorkee IITR, Roorkee 247667, Uttar Pradesh, India
[2] Natl Inst Technol Uttarakhand, Srinagar 246174, Garhwal, India
来源
EMERGING VLSI DEVICES, CIRCUITS AND ARCHITECTURES, VDAT 2023 | 2025年 / 1234卷
关键词
Stacked nanosheet FET; Substrate effect; Self-heating effect; RF; TECHNOLOGY; TRANSISTOR; FINFET;
D O I
10.1007/978-981-97-5269-0_6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Stacked nanosheet field effect transistors are the potential candidate for future CMOS-based design as a successor of the FinFET technology due to their improved short channel effect and higher effective width in the same area footprint. This research investigates the impact of self-heating and substrate effects on the small signal conductance and capacitance of FinFET and nanosheet devices using Synopsys TCAD. The presence of substrate introduces transitions in the conductance-frequency plot due to the substrate and self-heating effects in FinFET examined. Further, nanosheet devices show similar trends, with less pronounced substrate effects which is discussed first time in this work. Analyzing the effect of the type of substrate, voltage, work function, substrate doping, and electrode resistance variation provides further insights into the substrate-induced transition in the Nanosheet FET. These findings contribute to advancing nanoscale device technologies, particularly in RF applications.
引用
收藏
页码:57 / 68
页数:12
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