Growth of a hard, novel CVD multilayer coating: Ti(C,N) on (Ti,Al)N on TiN

被引：1

作者：

Ben Hassine, Mohamed ^{[1
,2
]}

Andren, Hans-Olof ^{[1
]}

Iyer, Anand H. S. ^{[1
]}

Backe, Olof ^{[1
]}

Stiens, Dirk ^{[3
]}

Janssen, Wiebke ^{[3
]}

Kuemmel, Johannes ^{[3
]}

Halvarsson, Mats ^{[1
]}

机构：

[1] Chalmers Univ Technol, Dept Phys, SE-41296 Gothenburg, Sweden

[2] King Abdullah Univ Sci & Technol KAUST, Core Labs, Thuwal 239556900, Saudi Arabia

[3] Walter AG, Derendinger Str 53, D-72072 Tubingen, Germany

来源：

INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2025年 / 127卷

关键词：

HRSTEM; WC-Co; Interfacial dislocations; CVD; TiCN; TiAlN; CHEMICAL-VAPOR-DEPOSITION; MECHANICAL-PROPERTIES; CUTTING PERFORMANCE; MICROSTRUCTURE; AL2O3;

D O I：

10.1016/j.ijrmhm.2024.106966

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A novel chemical vapor deposition (CVD) multilayer coating intended for cutting applications was designed to achieve high wear and heat resistance during metal machining. The coating consists of three layers: a TiCN layer deposited on top of a TiAlN layer, which was grown on a layer of TiN that was deposited onto a cemented carbide substrate. The detailed microstructure of the coating was examined using a combination of electron microscope techniques. Two pyramidal surface morphologies and textures were observed, which could be related to the substrate roughness. Two growth modes were found: epitaxial growth of (211) oriented TiCN on <211> oriented TiAlN on <211> oriented TiN, leading to tilted TiCN pyramids at the coating surface; and epitaxial growth of (111) TiCN on <111> TiAlN on <111> TiN, leading to symmetrical TiCN pyramids at the coating surface.

引用

页数：11

共 24 条

[1] Growth model for high-Al containing CVD TiAlN coatings on cemented carbides using intermediate layers of TiN [J].

Ben Hassine, Mohamed ;

Andren, Hans-Olof ;

Iyer, Anand H. S. ;

Lotsari, Antiope ;

Backe, Olof ;

Stiens, Dirk ;

Janssen, Wiebke ;

Manns, Thorsten ;

Kummel, Johannes ;

Halvarsson, Mats .

SURFACE & COATINGS TECHNOLOGY, 2021, 421

[2]

Bonetti R.S., 1990, Met. Powder Rep., V45, P837, DOI [10.1016/0026-0657(90)90575-2, DOI 10.1016/0026-0657(90)90575-2]

[3] CO addition in low-pressure chemical vapour deposition of medium-temperature TiCxN1-x based hard coatings [J].

Czettl, C. ;

Mitterer, C. ;

Muhle, U. ;

Rafaja, D. ;

Puchner, S. ;

Hutter, H. ;

Penoy, M. ;

Michotte, C. ;

Kathrein, M. .

SURFACE & COATINGS TECHNOLOGY, 2011, 206 (07) :1691-1697

[4] Novel aluminum-rich Ti1-xAlxN coatings by LPCVD [J].

Endler, I. ;

Hoehn, M. ;

Herrmann, M. ;

Pitonak, R. ;

Ruppi, S. ;

Schneider, M. ;

van den Berg, H. ;

Westphal, H. .

SURFACE & COATINGS TECHNOLOGY, 2008, 203 (5-7) :530-533

[5] Design and Characterization of Novel Wear Resistant Multilayer CVD Coatings with Improved Adhesion Between Al2O3 and Ti(C,N) [J].

Garcia, Jose ;

Pitonak, Reinhard ;

Weissenbacher, Ronald ;

Koepf, Arno ;

Soldera, Flavio ;

Suarez, Sebastian ;

Miguel, Federico ;

Pinto, Haroldo ;

Kostka, Aleksander ;

Muecklich, Frank .

ADVANCED ENGINEERING MATERIALS, 2010, 12 (09) :929-934

[6] Chemical-vapor deposition of wear resistant hard coatings in the Ti-B-C-N system: properties and metal-cutting tests [J].

Holzschuh, H .

INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 2002, 20 (02) :143-149

[7] Mechanical properties of TiN-TiC mixed crystal films [J].

Hyakutake, H ;

Imada, Y ;

Honda, F ;

Nakajima, K .

JOURNAL OF PHYSICS-CONDENSED MATTER, 1998, 10 (01) :111-121

[8] Microstructure, mechanical and thermo-physical properties of CVD TiCxN1-x coatings on cemented carbide substrates grown with C2H6 as C feeding precursor [J].

Kainz, Christina ;

Schalk, Nina ;

Tkadletz, Michael ;

Winkler, Markus ;

Czettl, Christoph .

SURFACE & COATINGS TECHNOLOGY, 2020, 394

[9] Growth, microstructure, and mechanical properties of arc evaporated TiCxN1-x (0 ≤ x ≤ 1) films [J].

Karlsson, L ;

Hultman, L ;

Johansson, MP ;

Sundgren, JE ;

Ljungcrantz, H .

SURFACE & COATINGS TECHNOLOGY, 2000, 126 (01) :1-14

[10] Characterization and properties of MTCVD TiCN and MTCVD ZrCN coatings [J].

Kudapa, S ;

Narasimhan, K ;

Boppana, P ;

Russell, WC .

SURFACE & COATINGS TECHNOLOGY, 1999, 120 :259-264

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