A 1.2-V compact Bandgap Reference with Curvature Compensation technology
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作者:
Yan, Zhenjie
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机构:Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Yan, Zhenjie
Zhang, Binhan
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机构:Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Zhang, Binhan
Yang, Rui
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机构:Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Yang, Rui
Zheng, Yi
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机构:Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Zheng, Yi
Li, Jinghu
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机构:
Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Xiamen Eochip Seiconductor Co Ltd, Xiamen 361009, Peoples R ChinaFujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Li, Jinghu
[1
,2
]
Luo, Zhicong
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机构:
Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R ChinaFujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Luo, Zhicong
[1
]
Sun, Qiyan
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机构:
Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R ChinaFujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
Sun, Qiyan
[1
]
机构:
[1] Fujian Agr & Forestry Univ, Fuzhou 350002, Peoples R China
[2] Xiamen Eochip Seiconductor Co Ltd, Xiamen 361009, Peoples R China
Sub-threshold;
curvature compensation;
low-area;
and bandgap reference voltage;
VOLTAGE REFERENCE;
CMOS;
TEMPERATURE;
NOISE;
D O I:
10.1587/elex.22.20250028
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
A low-area and low-temperature-coefficient (TC) bandgap reference (BGR) circuit using curvature compensation technology is presented. Comparing with traditional BGR with multiple BJT, four MOSFETs biased in their weak-inversion regions can produce a proportionalto-absolute-temperature (PTAT) voltage without consuming a great active area. In addition, a curvature compensation circuit was adopted to reduce the drift of temperature. The proposed BGR circuit has been implemented using a 0.18um technology, occupying an area of 0.01 mm2.Simulation results demonstrate that the BGR achieves average TC of 7.86ppm/degrees C from -40 degrees C to 125 degrees C at 3.3 V and the line regulation (LR) of 0.048%/V between 2.7 and 3.6 V supply voltage, respectively.
机构:
Infineon Technol North Amer Corp, Andover, MA 01810 USA
Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
Chen, Keng
;
Petruzzi, Luca
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机构:
Infineon Technol North Amer Corp, Andover, MA 01810 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
Petruzzi, Luca
;
Hulfachor, Ronald
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机构:
Infineon Technol North Amer Corp, Andover, MA 01810 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
Hulfachor, Ronald
;
Onabajo, Marvin
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机构:
Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
机构:
Infineon Technol North Amer Corp, Andover, MA 01810 USA
Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
Chen, Keng
;
Petruzzi, Luca
论文数: 0引用数: 0
h-index: 0
机构:
Infineon Technol North Amer Corp, Andover, MA 01810 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
Petruzzi, Luca
;
Hulfachor, Ronald
论文数: 0引用数: 0
h-index: 0
机构:
Infineon Technol North Amer Corp, Andover, MA 01810 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA
Hulfachor, Ronald
;
Onabajo, Marvin
论文数: 0引用数: 0
h-index: 0
机构:
Northeastern Univ, Dept Elect & Comp Engn, Boston, MA 02115 USAInfineon Technol North Amer Corp, Andover, MA 01810 USA