20 μm pitch Cu-to-Cu flip-chip interconnects through Cu nanoparticles sintering

被引:0
作者
Ji, Xinrui [1 ]
Du, Leiming [1 ]
van Zeijl, Henk [1 ]
Zhang, Guoqi [1 ]
Derakhshandeh, Jaber [2 ]
Beyne, Eric [2 ]
机构
[1] Delft Univ Technol, Microelect, ECTM, Delft, Netherlands
[2] IMEC, Leuven, Belgium
来源
PROCEEDINGS OF THE IEEE 74TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, ECTC 2024 | 2024年
关键词
copper nanoparticles; flip chip; fine pitch; all-Cu interconnects;
D O I
10.1109/ECTC51529.2024.00221
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This report demonstrates an innovative method to achieve large scale 20 mu m pitch Cu-Cu direct bonding, utilizing lithographic stencil printing to transfer small-sized nano-copper (CuNPs) paste and employs a thermocompression method for CuNPs sintering to establish interconnections between copper-pillars and CuNPs bumps. Shear tests were conducted to characterize the bonding strength. High-throughput 20 mu m pitch copper-to-copper direct bonding enables lower annealing temperatures for bulk- Cu to bulk-Cu bonding. Lithographic stencil printing is used to transfer the CuNPs paste, followed by sintering of the nanoparticles to establish interconnections. Shear tests and cross-section SEM were conducted to characterize the bonding strength and quality.
引用
收藏
页码:1891 / 1895
页数:5
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