Fabrication of birefringent plasmonic structures using novel collimated glancing angle E-beam evaporation method

被引：0
作者：
Haque, S. Maidul [1 ,3 ]
Goud, B. Karthik [1 ]
Ghorai, Gurupada [2 ]
De, Rajnarayan [1 ]
Prathap, C. [1 ]
Sahoo, P. K. [2 ,3 ]
Pradhan, S. [1 ,3 ]
机构：
[1] Bhabha Atom Res Ctr Facil, Atom & Mol Phys Div, Photon & Quantum Opt Sect, Visakhapatnam 531011, India
[2] Natl Inst Sci Educ & Res, Sch Phys Sci, Bhubaneswar 752050, India
[3] Homi Bhabha Natl Inst, Mumbai 400094, India
来源：
OPTICAL MATERIALS | 2025年 / 159卷
关键词：
E -beam evaporation; GLAD; Optical birefringence; Spectroscopic ellipsometry; Polarized transmittance; Ag nanocolumns; OPTICAL ANISOTROPY; AG NANOPARTICLES; DEPOSITION;
D O I：
10.1016/j.optmat.2025.116666
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A novel collimated glancing angle deposition (GLAD) modality in conjunction with e-beam evaporation technique has been explored to engineer Ag nano-morphology for achieving enhanced birefringence. The nanocolumner Ag thin films exhibiting strong optical birefringence have been fabricated by both conventional GLAD and novel collimated GLAD techniques. Simultaneous optical analysis of the samples using polarized transmittance spectra and spectroscopic ellipsometry spectra reveal that conventional GLAD films are more suitable for tunable optical polarizer application while collimated GLAD Ag thin films have an edge over conventional GLAD for waveplate/retardation plate application. The easy to fabricate negative uniaxial Ag nanostructures may serve as an important building block towards replacement of bulky birefringent material based optics with miniaturized thin film based optics.
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页数：8
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