Surge Current Distribution in Paralleled SiC MOSFETs Under Third-Quadrant Operation

被引:1
作者
Zhang, Man [1 ]
Li, Helong [1 ]
Yang, Zhiqing [1 ]
Zhao, Shuang [1 ]
Wang, Xiongfei [2 ]
Ding, Lijian [1 ]
机构
[1] Hefei Univ Technol, Anhui Prov Key Lab Semicond Packaging & Reliabil, Hefei 230009, Peoples R China
[2] KTH Royal Inst Technol, Sch Elect Engn & Comp Sci, S-10044 Stockholm, Sweden
关键词
Paralleled silicon carbide (SiC) metal-oxide-semiconductor-field-effect transistors (MOSFETS); surge current; third quadrant; TEMPERATURE; CONVERTERS; CAPABILITY;
D O I
10.1109/TPEL.2024.3485730
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surge current capability of paralleled silicon carbide (SiC) metal-oxide-semiconductor-field-effect transistors (mosfets) operating in both first and third quadrants is required in various applications. The surge current distribution in paralleled SiC mosfets during third quadrant operation needs further investigations. This article, therefore, establishes a source-drain resistance model of SiC mosfets under different gate bias in surge current range, which reveals the current "competition mechanism" between the MOS-channel path and the body diode path under surge current conditions. It then investigates the influence of device parameters discrepancy on surge current distribution in paralleled SiC mosfets. It finds out that the discrepancy of body diode parameters has significant influences on surge current distribution under different gate biases, while the parameter discrepancy of MOS-channel has much smaller impact on surge current distribution, even with positive gate bias. The conclusions of this article are supported with simulation and experimental results.
引用
收藏
页码:3077 / 3089
页数:13
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