Electrophoretic deposition of graphene coating as a corrosion inhibitor for copper in NaCl solution

Graphene coating on pure copper substrate was successfully prepared by electrophoretic deposition (EPD) technology. The effects of deposition parameters on the coating structure and its corrosion resistance in 3.5 wt% NaCl solution were investigated. The results show that the open circuit potential (OCP) of the coating sample (-0.107 V) is about 0.1 V higher than that of the substrate (-0.199 V), and the corrosion current density ( I corr ) decreases by an order of magnitude. Moreover, too long deposition time or too high deposition voltage will cause defects in the deposited coating, resulting in the weakening of corrosion resistance. The optimum deposition condition is 30 V for 40 min.