Optimization of electron beams for ion bombardment secondary emission electron gun

被引:0
|
作者
Wang, Zebin [1 ,2 ]
Liu, Junbiao [1 ,2 ]
Chen, Aiguo [3 ]
Wang, Dazheng [1 ]
Wang, Pengfei [1 ]
Han, Li [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst Elect Engn, Beijing 100190, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] China Aerodynam Res & Dev Ctr, Hyperveloc Aerodynam Inst, Mianyang 621000, Peoples R China
关键词
air plasma; secondary emission electron gun; electron beam; performance optimization;
D O I
10.1088/2058-6272/ad9819
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Electron beam fluorescence technology is an advanced non-contact measurement in rarefied flow fields, and the fluorescence signal intensity is positively correlated with the electron beam current. The ion bombardment secondary emission electron gun is suitable for the technology. To enhance the beam current, COMSOL simulations and analyses were conducted to examine plasma density distribution in the discharge chamber under the effects of various conditions and the electric field distribution between the cathode and the spacer gap. The anode shape and discharge pressure conditions were optimized to increase plasma density. Additionally, an improved spacer structure was designed with the dual purpose of enhancing the electric field distribution between the cathode-spacer gaps and improving vacuum differential effects. This design modification aims to increase the pass rate of secondary electrons. Both simulation and experimental results demonstrated that the performance of the optimized electron gun was effectively enhanced. When the electrode voltage remains constant and the discharge gas pressure is adjusted to around 8 Pa, the maximum beam current was increased from 0.9 mA to 1.6 mA.
引用
收藏
页数:9
相关论文
共 50 条
  • [41] SECONDARY ELECTRON EMISSION FROM METALS UNDER POSITIVE ION BOMBARDMENT IN HIGH EXTRACTIVE FIELDS
    WEBSTER, EW
    VANDEGRAAFF, RJ
    TRUMP, JG
    JOURNAL OF APPLIED PHYSICS, 1952, 23 (02) : 264 - 266
  • [42] SECONDARY ELECTRON EMISSION DURING BOMBARDMENT OF METALS WITH ARGON IONS
    LEBEDEV, SY
    OMELYANO.NM
    KROTOV, VI
    SOVIET PHYSICS SOLID STATE,USSR, 1969, 11 (06): : 1294 - +
  • [43] SECONDARY ELECTRON EMISSION COEFFICIENTS FOR LOW ENERGY POSITIVE ION BOMBARDMENT OF DISCHARGE CONDITIONED SURFACES
    PARKER, JH
    PHYSICAL REVIEW, 1953, 92 (02): : 536 - 536
  • [44] SECONDARY-ELECTRON EMISSION INDUCED BY ELECTRON-BOMBARDMENT OF POLYCRYSTALLINE METALLIC TARGETS
    BINDI, R
    LANTERI, H
    ROSTAING, P
    SCANNING MICROSCOPY, 1987, 1 (04) : 1475 - 1490
  • [45] Angular Dependence of Secondary Electron Emission from Cu Surfaces Induced by Electron Bombardment
    Commisso, M.
    Barone, P.
    Bonanno, A.
    Cimino, R.
    Grosso, D.
    Minniti, M.
    Oliva, A.
    Riccardi, P.
    Xu, F.
    PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 2008, 100
  • [47] Ion and electron bombardment-related ion emission during the analysis of diamond using secondary ion mass spectrometry
    de la Mata, Berta Guzman
    Dowsett, Mark G.
    JOURNAL OF APPLIED PHYSICS, 2007, 101 (03)
  • [48] Ion and electron bombardment-related ion emission during the analysis of diamond using secondary ion mass spectrometry
    Guzmán De La Mata, Berta
    Dowsett, Mark G.
    Journal of Applied Physics, 2007, 101 (03):
  • [49] Secondary electron emission in scanning Ga ion, He ion and electron microscopes
    Ishitani, T.
    Yamanaka, T.
    Inai, K.
    Ohya, K.
    VACUUM, 2010, 84 (08) : 1018 - 1024
  • [50] INVESTIGATION OF SECONDARY EMISSION MONITORS BY MEANS OF ELECTRON BEAMS
    ARKATOV, YM
    VATSET, PI
    VOLOSHCH.VI
    MARCHENK.VL
    NIKITIN, VA
    CHECHETE.VF
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES-USSR, 1966, (04): : 790 - &