Computational study of characteristics of atmospheric pressure glow discharge in helium

被引：0
作者：
Islamov, Gubad [1 ]
Eylenceoglu, Ender [1 ]
Rafatov, Ismail [1 ,2 ]
机构：
[1] Middle East Tech Univ, Dept Phys, TR-06800 Ankara, Turkiye
[2] Harbin Inst Technol, Sch Phys, Harbin 150001, Heilongjiang, Peoples R China
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2025年 / 34卷 / 02期
关键词：
gas discharge; helium; atmospheric pressure plasma; glow discharge; cathode spots; pattern formation; numerical simulation; SELF-ORGANIZATION; MODEL; BREAKDOWN;
D O I：
10.1088/1361-6595/adb786
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Numerical analysis of an atmospheric pressure glow discharge (APGD) in helium is carried out. Numerical models are spatially one- and two-dimensional and based on drift-diffusion theory of gas discharges. On the basis of the current-voltage and current density-voltage characteristic curves, the effects of the temperature regime on the cathode surface (cooled vs uncooled), the value of the secondary electron emission coefficient, and the thermal diffusion on the discharge parameters are studied. The possible transition of the discharge to an obstructed mode with gas heating is investigated. An analysis of the formation of normal APGD was carried out, which revealed good agreement with experimental data. The spontaneous emergence of cathode spots is illustrated and discussed.
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页数：16
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共 58 条
  • [21] Simonchik L, Tomkavich M, Islamov G, Eylenceoglu E, Rafatov I, Plasma Sources Sci. Technol, 33, (2024)
  • [22] Golubovskii Y B, Maiorov V, Behnke J, Behnke J, J. Phys. D: Appl. Phys, 36, (2002)
  • [23] Bogdanov E, Kapustin K, Kudryavtsev A, Chirtsov A, Tech. Phys, 55, pp. 1430-421430, (2010)
  • [24] Wang Q, Economou D J, Donnelly V M, J. Appl. Phys, 100, (2006)
  • [25] Rafatov I, Islamov G, Eylenceoglu E, Yesil C, Bogdanov E, Phys. Plasmas, 30, (2023)
  • [26] Demkin V, Melnichuk S, Postnikov A, Russ. Phys. J, 62, pp. 1890-81890, (2020)
  • [27] Demkin V, Melnichuk S, Postnikov A, Phys. Plasmas, 25, (2018)
  • [28] Boutrouche V, Trelles J P, J. Phys. D: Appl. Phys, 55, (2022)
  • [29] Boeuf J P, Pitchford L C, Phys. Rev. E, 51, pp. 1376-901376, (1995)
  • [30] Hagelaar G J M, Pitchford L C, Plasma Sources Sci. Technol, 14, pp. 722-33722, (2005)
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