Optical and magnetic properties of Zn0.9Mn0.05Fe0.05O thin films deposited by RF-magnetron sputtering

被引:0
|
作者
Malapati, V. [1 ]
机构
[1] VFSTR Deemed Univ, Sch Appl Sci, Dept Phys, Guntur 522213, Andhra Prades, India
关键词
RF sputtering; Thin films; Sputtering; Structure; Optical properties; Ferromagnetism; CHEMICAL BATH DEPOSITION; DOPED ZNO; RARE-EARTH; AL; NANOSTRUCTURES; LA; NI; CO;
D O I
10.1016/j.physb.2024.416607
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Zn0.9Mn0.05Fe0.05O were synthesized by rf-magnetron sputtering in an argon gas environment show a hexagonal wurtzite structure without any secondary phases of dopants MnO or Fe2O3. The crystallite (D) parameters estimated from the XRD pattern disclose a significant decrease with argon partial gas pressure from 3.34 to 11.80 nm. The surface morphology of as-deposited films has a dense columnar microstructure with an average grain size of about 14-18 nm with roughness (RMS) from 2.86 to 7.67 nm. The sputtered thin films exhibit high optical transmittance in the visible range with a significant redshift as a function of working pressure. The energy band gap shows a slight increase with gas pressure in the range of about 3.05-3.36 eV. The films deposited for argon gas pressures of 12 & 15 mTorr have room-temperature ferromagnetism due to oxygen vacancies/defect concentrations in the host ZnO matrix.
引用
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页数:6
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