Mechanistic understanding of self-limiting oxidation behavior of copper nanowires with dense twin boundaries

被引:0
|
作者
Chen, Hsin-Yu [1 ]
Chen, Hsin-Yi Tiffany [1 ,2 ,3 ]
Liao, Chien-Neng [1 ,3 ]
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 300044, Taiwan
[2] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300044, Taiwan
[3] Natl Tsing Hua Univ, Coll Semicond Res, Hsinchu 300044, Taiwan
关键词
Copper nanowires; Twin structure; Surface oxidation; Transmission electron microscopy; Density functional theory; CU; DIFFUSION;
D O I
10.1016/j.apsusc.2025.162753
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Metal oxidation has long been an interesting and important research topic because it strongly impacts the electrical and mechanical properties of metals. Copper typically lacks the self-limiting oxidation characteristics observed in aluminum, chromium, and titanium. Nevertheless, Cu nanowires with dense coherent twin boundaries (CTBs) exhibit superior stability against further oxidation by forming a conformal thin surface oxide layer. This study reports an experimental and theoretical investigation of the unusual self-limiting oxidation behavior of nanotwinned Cu (nt-Cu) nanowires. The results indicate that CTB-intersected surface junctions decrease atomic step density and minimize oxide nuclei populations on nt-Cu surfaces. A two-dimensional oxide growth is suggested due to the reduced activity of Cu adatoms detaching from the concave CTB-intersected junctions. Consequently, the underlying nt-Cu nanowire is protected from further oxidation by a thin and conformal oxide layer.
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页数:7
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