Semiconductor laser collimation and shaping design based on the combination of a rotationally symmetrical lens and a cylindrical lens

A dual-lens collimation and shaping system which is composed of a rotationally symmetric lens and an aspherical cylindrical lens is proposed in this paper. The system design method is discussed in detail, and the divergent elliptical laser beams are finally converted into collimated circular beams. The simulation results show that the maximum divergence angle of the beams can be collimated to 2.58 mu rad, the standard deviation of the edge beam radius samples (SDRS) can be decreased from the original 4.227 to 0.135 mm, and the ratio of beam waist (RBW) drops from 1.554 to 1.0093 in the case of the output beam radius of 40 mm. The effects of transmission distance, astigmatism, wavelength deviation, light source offset, and lens offset on the collimation shaping effect are discussed. The collimation system can be widely used in long-distance optical communication systems and the design method in this paper can provide some new ideas for optical design researchers.