The diffusion behaviors in Mg/Al interface under variated temperatures and surface roughness

被引:0
作者
Yu, Zelong [1 ]
Zhang, Zhao [1 ]
机构
[1] Dalian Univ Technol, Sch Mech & Aerosp Engn, State Key Lab Struct Anal Optimizat & CAE Software, Dalian, Peoples R China
基金
中国国家自然科学基金;
关键词
Molecular dynamics; Mg-Al interface; diffusion; roughness; temperature; MOLECULAR-DYNAMICS SIMULATION; MECHANICAL-PROPERTIES; AL; MICROSTRUCTURE; ALLOYS; LAYER;
D O I
10.1080/01411594.2025.2461689
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
To understand the mechanism for controlling of diffusion behaviors in Mg-Al interface of bonding and welding, molecular dynamics method, and embedded atom potential are used to study how the temperature variations and surface roughness affect the diffusion behaviors in Mg-Al interface. Results indicated that the diffusion coefficients of Mg and Al atoms increase with the increase of temperature, which satisfies the Arrhenius formula. The number of diffusion atoms and the diffusion coefficient of Al atoms are higher than Mg atoms, which is caused by the smaller radius of Al atoms and stronger bond of Al atoms. The diffusion coefficient can be increased with the increase of the surface roughness. The pre-filled atoms on the rough surface can enhance the diffusion of Mg-Al interface.
引用
收藏
页码:85 / 108
页数:24
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