Effect of TiN diffusion barrier on interdiffusion between Mo-Si-B coating and Nb-Si based alloy

被引：1
作者：
Hou, Qingyan [1 ]
Li, Meifeng [2 ,3 ]
Chen, Zheng [4 ]
Zhou, Chungen [2 ]
机构：
[1] Beijing Acad Sci & technol, Inst Radiat Technol, Beijing 100875, Peoples R China
[2] Beihang Univ, Dept Mat Sci & Engn, Beijing 100191, Peoples R China
[3] Eastern Inst Technol, Coll Engn, Ningbo, Peoples R China
[4] Zhengzhou Univ Aeronaut, Sch Aero Engine, Zhengzhou 450046, Peoples R China
来源：
MATERIALS CHEMISTRY AND PHYSICS | 2025年 / 337卷
基金：
中国国家自然科学基金;
关键词：
Molybdenum-silicon-boron coating; TiN diffusion barrier; Magnetron sputtering; SPS; First-principles calculation; TITANIUM NITRIDE FILMS; 1250; DEGREES-C; MICROSTRUCTURAL EVOLUTION; SILICON; OXIDATION; BEHAVIOR; EFFICIENCY;
D O I：
10.1016/j.matchemphys.2025.130584
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A TiN film was fabricated between a molybdenum-silicon-boron coating and a niobium-silicon based alloy by magnetron sputtering. Interdiffusion characteristics involving the coating and substrate were studied in the isothermal oxidation test at 1250 degrees C. The results showed that TiN interlayer effectively blocked interdiffusion between the coating and its substrate. The performance of the TiN interlayer in blocking diffusion was assessed via first-principles modeling. The study revealed that the diffusion barrier energy of Si in TiN (0.850 eV/atom) exceeds that of MoSi2 (0.032 eV/atom) and Nb (0.072 eV/atom).
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页数：7
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