Design and Optimization of High Performance Multi-Step Separated Trench 4H-SiC JBS Diode

被引:0
作者
Li, Jinlan [1 ]
Wu, Ziheng [1 ]
Sheng, Huaren [1 ]
Xu, Yan [1 ]
Zhou, Liming [2 ]
机构
[1] Yangzhou Univ, Coll Informat Engn, Yangzhou 225009, Peoples R China
[2] Yangjie Elect Technol Co Ltd, Yangzhou 225009, Peoples R China
基金
中国国家自然科学基金;
关键词
4H-SiC junction barrier Schottky (JBS); multi-step trench; trench FLR; electric field; blocking voltage; MOSFET;
D O I
10.3390/electronics13214143
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
In this paper, a novel 3300 V/40 A 4H-SiC junction barrier Schottky diode (JBS) with a multi-step separated trench (MST) structure is proposed and thoroughly investigated using TCAD simulations. The results show that the introduction of MST expands the Schottky contact area, resulting in a decrease in the forward voltage drop. Furthermore, the combination of the deep P+ shielded region and the central P+ region effectively reduces the leakage current, leading to a 43.7% increase in the blocking voltage compared to conventional 4H-SiC JBS. The effects of the step depth (ds) and the width of the central P+ region (wm) on the device performance are analyzed in depth. In addition, a multi-step trenched linearly graded field-limiting rings (MTLG-FLR) termination ensures a more uniform electric field distribution, and the terminal protection efficiency reaches up to 90%, which further enhances the reliability of the terminal structure.
引用
收藏
页数:10
相关论文
共 27 条
[1]   A Novel SiC MOSFET Embedding Low Barrier Diode With Enhanced Third Quadrant and Switching Performance [J].
Deng, Xiaochuan ;
Xu, Xiaojie ;
Li, Xuan ;
Li, Xu ;
Wen, Yi ;
Chen, Wanjun .
IEEE ELECTRON DEVICE LETTERS, 2020, 41 (10) :1472-1475
[2]  
Deng XC, 2018, 2018 1ST WORKSHOP ON WIDE BANDGAP POWER DEVICES AND APPLICATIONS IN ASIA (WIPDA ASIA), P144, DOI 10.1109/WiPDAAsia.2018.8734553
[3]  
Donato N, 2020, PROC INT SYMP POWER, P198, DOI [10.1109/ISPSD46842.2020.9170197, 10.1109/ispsd46842.2020.9170197]
[4]   Design and fabrication of high performance 4H-SiC TJBS diodes [J].
Dou, Wentao ;
Song, Qingwen ;
Yuan, Hao ;
Tang, Xiaoyan ;
Zhang, Yuming ;
Zhang, Yimen ;
Xiao, Li ;
Wang, Liangyong .
JOURNAL OF CRYSTAL GROWTH, 2020, 533
[5]   Design and Fabrication of 1.2 kV/10A 4H-SiC Junction Barrier Schottky Diodes with High Current Density [J].
Kang, In Ho ;
Seok, Ogyun ;
Moon, Jeong Hyun ;
Na, Moon Kyong ;
Kim, Hyoung Woo ;
Kim, Sang Cheol ;
Bahng, Wook ;
Kim, Nam Kyun .
TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, 2021, 22 (02) :115-120
[6]   An Optimal Design for 1.2kV 4H-SiC JBSFET (Junction Barrier Schottky Diode Integrated MOSFET) With Deep P-Well [J].
Kim, Dongyoung ;
Jang, Seung Yup ;
DeBoer, Skylar ;
Morgan, Adam J. ;
Sung, Woongje .
IEEE ELECTRON DEVICE LETTERS, 2022, 43 (05) :785-788
[7]   High Single-Event Burnout Resistance 4H-SiC Junction Barrier Schottky Diode [J].
Li, Mao-Bin ;
Cao, Fei ;
Hu, Hai-Fan ;
Li, Xing-Ji ;
Yang, Jian-Qun ;
Wang, Ying .
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2021, 9 (09) :591-598
[8]   Experimental and Simulation Study of Single-Event Leakage Current Degradation and Damage Mechanism in 4H-SiC PiN Diodes [J].
Liu, Keyu ;
Zhang, Zhiwen ;
Tang, Xiaoyan ;
Yuan, Hao ;
Zhang, Yibo ;
Liu, Yancong ;
Han, Chao ;
Zhou, Yu ;
Du, Fengyu ;
Wang, Zixi ;
Song, Qingwen ;
Zhang, Yuming .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (08) :4891-4896
[9]  
Lynch J, 2019, PROC INT SYMP POWER, P223, DOI [10.1109/ISPSD.2019.8757593, 10.1109/ispsd.2019.8757593]
[10]  
Mancini S.A., 2022, P 2022 IEEE INT REL, VVolume 62