A new technical solution to the problem of increasing the resolution of X-ray diffraction methods

A new technical solution to the problem of increasing the resolution of X-ray diffraction methods has been proposed and implemented, based on linearly enlarging the X-ray topographic patterns. For implementation of the suggested method, a novel device has been developed, created and tested that makes it possible to scan synchronously the slit for transmitting separate parts of the X-ray diffraction pattern and the X-ray film with a predetermined speed ratio. The possibility of significantly increasing the resolution of X-ray diffraction patterns with the suggested new scanning method has been experimentally proven. It was shown that if individual parts of the diffracted beam are passed successively through a narrow slit, which is synchronously scanned along with the X-ray detecting film, we obtain an enlargement in topographic patterns. A proposed scheme for enlarging the image in parts and a description and the operating principle of the scanning device are also presented. The relationship between the ratio of the speeds of the slit and the X-ray film movement and the parameters of the scanning device and the sample (slit width, total thickness of thin crystals, thickness of a thick crystal etc.) was revealed. The speeds of the reciprocating motion of the slit and the X-ray film were calculated. It has been experimentally proven that the scanning process does not introduce new information into the interference pattern but only enlarges it, since these patterns in sectional topograms differ only in size in the scattering plane.