Alkylammonium passivation for 2D tin halide perovskite field-effect transistors

被引:0
|
作者
Kim, Hakjun [1 ,2 ]
Lee, Cheong Beom [3 ,4 ]
Jeong, Bum Ho [1 ,2 ]
Lee, Jongmin [1 ,2 ]
Choi, Jia [1 ,2 ]
Kim, Kyeounghak [4 ]
Park, Hui Joon [1 ,2 ,5 ]
机构
[1] Hanyang Univ, Dept Organ & Nano Engn, Seoul 04763, South Korea
[2] Hanyang Univ, Human Tech Convergence Program, Seoul 04763, South Korea
[3] Hanyang Univ, Dept Chem, Seoul 04763, South Korea
[4] Hanyang Univ, Dept Chem Engn, Seoul 04763, South Korea
[5] Hanyang Univ, Dept Semicond Engn, Seoul 04763, South Korea
基金
新加坡国家研究基金会;
关键词
PERFORMANCE; ADDITIVES;
D O I
10.1039/d4tc05307a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tin (Sn) halide perovskites have shown significant potential as channels for field-effect transistors (FETs) due to their low effective mass, reduced Fr & ouml;hlich interaction, as well as lead-free composition, a requirement for electronic components. However, their inherent instability has limited their practical application. Here, we reveal that alkyl ammonium additives of appropriate size can efficiently passivate A-site defects in two-dimensional (2D) Sn halide perovskites, thereby promoting ideal octahedral formation and enhancing hydrogen bonding between A-site and X-site components. These effects lead to improved structural stability, as evidenced by enhanced crystallinity, reduced non-radiative recombination, and decreased Sn oxidation. FETs incorporating perovskites with alkylammonium cations of optimal chain length and multiple functional groups-specifically, propane-1,3-diammonium iodide-exhibit superior performance metrics, including a maximum field-effect mobility of 2.6 cm2 V-1 s-1, an on/off current ratio exceeding 106, and a threshold voltage approaching 0 V.
引用
收藏
页码:6806 / 6815
页数:10
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