Diffusion resistance behavior of W between MoSi2 coating and C103 alloy

被引：0

作者：

Wu, Wenxing ^{[1
,2
,3
]}

Wu, Jianhang ^{[1
,2
,3
]}

Sun, Anying ^{[1
,2
,3
]}

Zhu, Jianyang ^{[1
,2
,3
]}

Tang, Hongqun ^{[1
,2
,3
]}

Shen, Fang ^{[1
]}

Lei, Shengyuan ^{[1
,2
,3
]}

机构：

[1] Guangxi Univ, Guangxi Key Lab Petrochem Resource Proc & Proc Int, Sch Chem & Chem Engn, Sch Resources Environm & Mat, Nanning 530004, Guangxi, Peoples R China

[2] Guangxi Univ, Educ Dept Guangxi Zhuang Autonomous Reg, Key Lab High Performance Struct Mat & Thermo Surfa, Nanning 530004, Peoples R China

[3] Guangxi Univ, State Key Lab Featured Met Mat & Life Cycle Safety, Nanning 530004, Guangxi, Peoples R China

来源：

INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2025年 / 128卷

关键词：

MoSi; 2; coating; C103; alloy; Diffusion barrier; Electronegativity; W; OXIDATION; INTERDIFFUSION; W5SI3;

D O I：

10.1016/j.ijrmhm.2025.107076

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

MoSi2/W composite coatings were prepared on C103 alloy by sol-gel (SG) and spark plasma sintering (SPS) processes. After oxidation at 1550 degrees C for 100 h, the generation of volume expansion could fill the tiny pores in the W diffusion barrier layer. The diffusion growth rate of MoSi2/W coating was 109.76 mu m2/h, which is only 56 % of that of MoSi2 coating. This was attributed to the fact that the diffusion barrier of Si atoms in W (0.383 eV) was higher than that in Nb (0.022 eV), and there was a significant difference in electronegativity between Si-W (0.212) and Si-Nb (0.090).

引用

页数：9

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