Diffusion resistance behavior of W between MoSi2 coating and C103 alloy

被引：0
|
作者：
Wu, Wenxing [1 ,2 ,3 ]
Wu, Jianhang [1 ,2 ,3 ]
Sun, Anying [1 ,2 ,3 ]
Zhu, Jianyang [1 ,2 ,3 ]
Tang, Hongqun [1 ,2 ,3 ]
Shen, Fang [1 ]
Lei, Shengyuan [1 ,2 ,3 ]
机构：
[1] Guangxi Univ, Guangxi Key Lab Petrochem Resource Proc & Proc Int, Sch Chem & Chem Engn, Sch Resources Environm & Mat, Nanning 530004, Guangxi, Peoples R China
[2] Guangxi Univ, Educ Dept Guangxi Zhuang Autonomous Reg, Key Lab High Performance Struct Mat & Thermo Surfa, Nanning 530004, Peoples R China
[3] Guangxi Univ, State Key Lab Featured Met Mat & Life Cycle Safety, Nanning 530004, Guangxi, Peoples R China
来源：
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2025年 / 128卷
关键词：
MoSi; 2; coating; C103; alloy; Diffusion barrier; Electronegativity; W; OXIDATION; INTERDIFFUSION; W5SI3;
D O I：
10.1016/j.ijrmhm.2025.107076
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
MoSi2/W composite coatings were prepared on C103 alloy by sol-gel (SG) and spark plasma sintering (SPS) processes. After oxidation at 1550 degrees C for 100 h, the generation of volume expansion could fill the tiny pores in the W diffusion barrier layer. The diffusion growth rate of MoSi2/W coating was 109.76 mu m2/h, which is only 56 % of that of MoSi2 coating. This was attributed to the fact that the diffusion barrier of Si atoms in W (0.383 eV) was higher than that in Nb (0.022 eV), and there was a significant difference in electronegativity between Si-W (0.212) and Si-Nb (0.090).
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页数：9
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