Enabling Ultra-Broadband High-Efficiency Gratings for Single-Cycle Infrared Lasers

被引:0
作者
Chen, Trevor B. [1 ]
Hsu, Paul S. [1 ]
机构
[1] Spectral Energies LLC, Beavercreek, OH 45430 USA
来源
NANOENGINEERING: FABRICATION, PROPERTIES, OPTICS, THIN FILMS, AND DEVICES XXI | 2024年 / 13116卷
关键词
High-Efficiency Grating; Single-Cycle Ultrafast Laser; E-beam Lithography; Anisotropic Wet Etching; Broadband Grating; Ultrafast Infrared Laser; FEMTOSECOND LASER;
D O I
10.1117/12.3032561
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
To generate the shortest high power laser pulse, a single-cycle pulse, gratings inside the ultrafast laser's compressor and stretcher need to meet three requirements: high efficiency, ultra-broad bandwidth, and high damage threshold. These three requirements are especially difficult to meet for Infrared (IR) lasers. We have demonstrated for the first time that combination of E-beam lithography and anisotropic wet etching of silicon wafers can produce gratings meeting the three requirements. A global optimization approach is used to achieve diffraction efficiency > 90% for mid IR gratings centered at 5 um with a 65% relative bandwidth, which is 1.47x (2.1x) lager than required by Gaussian-shaped (sech(2)-shaped) single-cycle pulses. A similar high-efficiency mid-IR grating was recently fabricated and tested, demonstrating an efficiency of 92.0% at 4.3 mu m, which closely matches the designed efficiency of 94.5%. Conformal coatings in fabrication and large angle of incidence in design are employed to improve damage threshold. Further enhancement of the grating performance has been realized through a double-blazing feature, combining the classic triangular groove geometry with a "land-ridge" modulation. The design methodology has been applied to near IR and long IR successfully to prove that the new design approach and fabrication technology combined is a reliable way to make gratings for single-cycle high-power ultrafast laser for entire IR region (0.8 um - 20 um).
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页数:12
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