UVC irradiation of alpha particles tracks and empirical equation of bulk etch rate in CR-39 detector

被引：0

作者：

Al-Jubbori, Mushtaq Abed ^{[1
]}

Alkhayat, R. B. ^{[1
]}

Ali, Mohsin Hassan ^{[2
]}

Mahmood, Rasha W. ^{[3
]}

机构：

[1] Univ Mosul, Coll Educ Pure Sci, Dept Phys, Mosul 41001, Iraq

[2] Tikrit Univ, Coll Educ pure Sci, Dept Phys, Tikrit, Iraq

[3] Minist Educ, Directorate Nineveh Educ, Mosul, Iraq

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2025年 / 559卷

关键词：

UVC irradiation; CR-39; detector; alpha particle energy; Empirical equation; Etching time; ULTRAVIOLET-RADIATION; PARAMETERS; PROFILES; SENSITIZATION; REGISTRATION; DEPENDENCE; LENGTH; PADC;

D O I：

10.1016/j.nimb.2024.165596

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The first empirical equation is presented in this paper to characterize the behavior of the bulk etch rate (Vb) with the UVC dose. The Vb value increased nonlinearly with UVC irradiation during the initial dose of up to 13 J, then remained almost constant with prolonged UVC doses from 13 to 45 J. The alpha track depths in CR-39 were analyzed with UVC irradiation (lambda = 254 nm). Samples exposed to UVC radiation achieved the maximum track depth with a shorter etching time than samples not exposed to UVC radiation. The Vt values increased significantly for samples exposed to UVC up to 7.1, 7.0, and 6.9 mu m/h, respectively, at alpha energies of 2.5, 3.5, and 4.5 MeV. While the etch rate ratio decreased for the same samples.

引用

页数：6

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