共 50 条
- [11] Influence of grain size of Cu target on its magnetron sputtering erosion and parameters Journal of Materials Science: Materials in Electronics, 2021, 32 : 26181 - 26188
- [12] FCC tantalum thin films deposited by magnetron sputtering SURFACE & COATINGS TECHNOLOGY, 2019, 358 : 942 - 946
- [14] Magnetron Sputtering Yield and Relative Factors NATURAL RESOURCES AND SUSTAINABLE DEVELOPMENT, PTS 1-3, 2012, 361-363 : 1655 - +
- [15] Effect of sputtering target's grain size on the sputtering yield, particle size and coercivity (Hc) of Ni and Ni20Al thin films 2ND INTERNATIONAL MANUFACTURING ENGINEERING CONFERENCE AND 3RD ASIA-PACIFIC CONFERENCE ON MANUFACTURING SYSTEMS (IMEC-APCOMS 2015), 2016, 114
- [17] Grain size effect on structural, electrical and mechanical properties of NiTi thin films deposited by magnetron co-sputtering SURFACE & COATINGS TECHNOLOGY, 2009, 203 (12): : 1596 - 1603
- [18] Tantalum nitride seed layers for Bcc tantalum coatings deposited on steel by magnetron sputtering SURFACE ENGINEERING 2002-SYNTHESIS, CHARACTERIZATION AND APPLICATIONS, 2003, 750 : 337 - 342
- [20] Characteristics of tantalum oxynitride films prepared by RP magnetron sputtering OPTICAL METROLOGY ROADMAP FOR THE SEMICONDUCTOR, OPTICAL, AND DATA STORAGE INDUSTRIES, 2000, 4099 : 246 - 254