Influence of different hydrocarbons on impurities and minority carrier lifetime in 4H-SiC epitaxial layers

被引:1
|
作者
Ghezellou, Misagh [1 ]
Lemva Ousdal, Erlend [2 ]
Bathen, Marianne E. [2 ]
Vines, Lasse [2 ]
Ul-Hassan, Jawad [1 ]
机构
[1] Linkoping Univ, Dept Phys Chem Biol IFM, SE-58183 Linkoping, Sweden
[2] Univ Oslo, Ctr Mat Sci & Nanotechnol, Dept Phys, N-0316 Oslo, Norway
来源
JOURNAL OF PHYSICS-MATERIALS | 2025年 / 8卷 / 02期
基金
瑞典研究理事会;
关键词
4H-SiC; minority carrier lifetime; TRPL; DLTS; methane; propane; Cl-based chemistry; CHEMICAL-VAPOR-DEPOSITION; GROWTH-RATE; PRECURSOR;
D O I
10.1088/2515-7639/adb7c0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This study explores the influence of different hydrocarbons, methane and propane, on the properties of 4H-SiC epitaxial layers grown by chloride-based chemical vapor deposition. By systematically varying the C/Si and N/C ratios during epitaxial growth, and employing a comprehensive suite of characterization techniques, a better understanding of how growth conditions influence material properties is gained. We show that the n-type dopant incorporation strongly depends on the choice of hydrocarbon especially at lower doping levels. Furthermore, we have observed that methane contributes to a relatively longer carrier lifetime value compared to propane, though a similar lifetime limiting carbon vacancy defect concentration has been observed for both hydrocarbons in as-grown epitaxial layers. Moreover, additional defect levels are also suggested by deep-level transient spectroscopy, potentially related to chlorine complexes, with varying concentrations depending on the choice of hydrocarbon and C/Si ratio. These observations offer insights into the complicated interplay of factors influencing doping, minority carrier lifetime, and defect formation in 4H-SiC epitaxial layers during the epitaxial growth process, and contribute to the optimization of growth parameters depending on the application in question.
引用
收藏
页数:12
相关论文
共 50 条
  • [31] CL/EBIC-SEM techniques for evaluation of impact of crystallographic defects on carrier lifetime in 4H-SiC epitaxial layers
    Maximenko, S. I.
    Freitas, J. A., Jr.
    Picard, Y. N.
    Klein, P. B.
    Myers-Ward, R. L.
    Lew, K. -K.
    Muzykov, P. G.
    Gaskill, D. K.
    Eddy, C. R., Jr.
    Sudarshan, T. S.
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 211 - +
  • [32] Wafer Level Recombination Carrier Lifetime Measurements of 4H-SiC PiN Epitaxial Wafers
    Chung, G.
    Loboda, M. J.
    MacMillan, M. F.
    Wan, J. W.
    SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 287 - 290
  • [33] Minority carrier lifetime measurements in epitaxial silicon layers
    Hara, T
    Tamura, F
    Kitamura, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (06) : 2205 - 2205
  • [34] Minority carrier lifetime measurement in epitaxial silicon layers
    Hara, T
    Tamura, F
    Kitamura, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (04) : L54 - L57
  • [35] Measurement of minority carrier lifetime in epitaxial silicon layers
    Kitamura, T
    Tamura, F
    Hara, T
    Hourai, M
    Tsuya, H
    PROCEEDINGS OF THE FOURTH INTERNATIONAL SYMPOSIUM ON HIGH PURITY SILICON, 1996, 96 (13): : 533 - 543
  • [36] Optical studies of nonequilibrium carrier dynamics in highly excited 4H-SiC epitaxial layers
    Neimontas, K
    Aleksiejunas, R
    Sudzius, M
    Jarasiunas, K
    Bergman, JP
    SILICON CARBIDE AND RELATED MATERIALS 2004, 2005, 483 : 413 - 416
  • [37] Temperature Dependence of the Carrier Lifetime in 4H-SiC Epilayers
    Klein, P. B.
    Myers-Ward, R.
    Lew, K. -K.
    VanMil, B. L.
    Eddy, C. R., Jr.
    Gaskill, D. K.
    Shrivastava, A.
    Sudarshan, T. S.
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 203 - +
  • [38] Influence of Substrate Preparation and Epitaxial Growth Parameters on the Dislocation Densities in 4H-SiC Epitaxial Layers
    Kallinger, B.
    Thomas, B.
    Friedrich, J.
    SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, 2009, 600-603 : 143 - +
  • [39] Correlation between Stacking Faults in Epitaxial Layers of 4H-SiC and Defects in 4H-SiC Substrate
    Guo Yu
    Peng Tong-Hua
    Liu Chun-Jun
    Yang Zhan-Wei
    Cai Zhen-Li
    JOURNAL OF INORGANIC MATERIALS, 2019, 34 (07) : 748 - 754
  • [40] Structure of the carrot defect in 4H-SiC epitaxial layers
    Benamara, M
    Zhang, X
    Skowronski, M
    Ruterana, P
    Nouet, G
    Sumakeris, JJ
    Paisley, MJ
    O'Loughlin, MJ
    APPLIED PHYSICS LETTERS, 2005, 86 (02) : 021905 - 1