Editorial for focus on emerging processes and applications of atomic and molecular layer deposition

被引：0
|
作者：
Meng, Xiangbo [1 ]
Elam, Jeffrey W. [2 ]
Barry, Sean [3 ]
机构：
[1] Univ Arkansas, Dept Mech Engn, Fayetteville, AR 72701 USA
[2] Appl Mat Div, Argonne Natl Lab, Lemont, IL 60439 USA
[3] Carleton Univ, Dept Chem, Ottawa, ON K1S 5B6, Canada
来源：
NANOTECHNOLOGY | 2025年 / 36卷 / 09期
基金：
加拿大自然科学与工程研究理事会;
关键词：
D O I：
10.1088/1361-6528/ad9d4b
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
This Focus aims to provide a platform for the latest research progress in atomic and molecular layer deposition (ALD and MLD), which collects 10 original research articles and 2 review papers. The original research articles present new precursors, new processes, and new applications. The review papers give a timely summary on the surface chemistry of metal ALD processes and flexible electronics resulting from ALD and MLD, respectively. This ensemble forms a valuable collection that advances our understanding and knowledge of ALD and MLD, and inspires the continued development of these valuable technologies.
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收藏
页数：5
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