In Situ Probe Measurements of Plasma Parameters during the Deposition of Boron Coatings by the Magnetron Method

被引：0
|
作者：
Gushenets, V. I. [1 ]
Bugaev, A. S. [1 ]
Vizir, A. V. [1 ]
Oks, E. M. [1 ,2 ]
Nikolaev, A. G. [1 ]
Yushkov, G. Yu. [1 ]
机构：
[1] Russian Acad Sci, Siberian Branch, Inst High Current Elect, Tomsk, Russia
[2] Tomsk State Univ Control Syst & Radioelect, Tomsk, Russia
来源：
TECHNICAL PHYSICS | 2024年 / 69卷 / 07期
关键词：
plasma parameters; probe method; planar magnetron; boron films; LANGMUIR PROBE; TEMPERATURE; IRON;
D O I：
10.1134/S1063784224070156
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The features of the probe technique are described and the results of measuring the parameters of plasma generated by a planar magnetron sputtering system with a pure boron target during coating deposition are presented. A feature of probe measurements was the use of heating the collecting surface of a single Langmuir probe. Heating led to a decrease in the electrical resistance of the boron film on the surface, which made it possible to carry out in situ probe measurements of the magnetron discharge plasma parameters during the entire process of boron coating.
引用
收藏
页码：1967 / 1972
页数：6
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