Effect of Reactive Magnetron Sputtering Modes (DCMS, HIPIMS, and DC plus HIPIMS) on the Properties of Copper Oxide Films

被引：0

作者：

Semenov, V. A. ^{[1
]}

Rabotkin, S. V. ^{[1
]}

Grenadyorov, A. S. ^{[1
]}

Solovyev, A. A. ^{[1
]}

Oskirko, V. O. ^{[1
]}

Zakharov, A. N. ^{[1
]}

Shipilova, A. V. ^{[1
]}

机构：

[1] Russian Acad Sci, Siberian Branch, Inst High Current Elect, Tomsk 634055, Russia

来源：

PHYSICS OF METALS AND METALLOGRAPHY | 2024年 / 125卷 / 13期

关键词：

magnetron sputtering; HIPIMS; hybrid reactive sputtering; cupric oxide; electrical conductivity; X-ray diffraction; optical properties; THIN-FILMS; ELECTRICAL-PROPERTIES; VAPOR-DEPOSITION; ENHANCEMENT; PARAMETERS; CU2O;

D O I：

10.1134/S0031918X24600180

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

Copper oxide (CuO) films have been grown by reactive DC magnetron sputtering, high-power impulse magnetron sputtering (HIPIMS), and a hybrid process (DC + HIPIMS). Their resistivity has been measured by the four probe van der Pauw method, and their rms surface roughness has been assessed by atomic force microscopy. The phase composition of the films has been determined by X-ray diffraction, and their chemical state has been studied by X-ray photoelectron spectroscopy. Their band gap has been determined by the Tauc method using their transmission and reflection spectra measured on a spectrophotometer. The results have been used for a comparative analysis of the properties of the CuO films grown in different deposition modes and to demonstrate advantages and drawbacks of the magnetron sputtering modes used.

引用

页码：1593 / 1600

页数：8

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