Topological quantum materials in catalysis

被引:0
作者
Sudrajat, Hanggara [1 ,2 ,3 ]
机构
[1] Natl Res & Innovat Agcy BRIN, Res Ctr Quantum Phys, Quantum Devices & Technol Res Grp, South Tangerang 15314, Indonesia
[2] Indonesian Quantum Initiat IQI, Quantum Mat & Devices, South Tangerang 15314, Indonesia
[3] BRIN Inst Teknol Bandung, Collaborat Res Ctr Adv Energy Mat, Bandung 40132, Indonesia
关键词
BASAL-PLANE; ACTIVATION; SEMIMETAL; SURFACE;
D O I
10.1039/d4ta08325c
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Topological quantum materials (TQMs) have introduced a new paradigm in heterogeneous catalysis, offering exceptionally high electron mobility, protected surface states, and resistance to surface contamination, making them promising candidates for next-generation catalysts. These unique properties enable TQMs to sustain catalytic performance even under harsh reaction conditions. However, challenges remain in understanding how TQMs facilitate catalytic reactions, and control reaction pathways, and how they can be engineered for enhanced performance. This highlight seeks to stimulate discussion on the future of topological catalysis, aiming to unlock its full potential for enabling more efficient chemical processes driven by charge carriers.
引用
收藏
页码:6325 / 6341
页数:17
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