Growth of thick amorphous carbon films on alumina for improved tribological properties

Alumina, as a pivotal ceramic material extensively utilized in contemporary applications, the surface modification and enhancement of tribological properties are crucial. In this study, reactive magnetron sputtering was employed to deposit Ti, Si co-doped hydrogen-free (TiSi/a-C), and hydrogenated amorphous carbon films (TiSi/a-C:H) with a thickness exceeding 7 mu m onto the surface of alumina ceramic substrates. Utilizing the design of the film structure, the difficulty of film-substrate adhesion was resolved by controlling the deposition time to influence the growth rate of the film, thereby enabling the reliable fabrication of thick films. The adhesion of the TiSi/a-C film exhibits the highest value, with an Lc1 value of 36.7 N. The hardness of the TiSi/a-C:H reaches a maximum of 15.2 GPa, and the hardness is closely correlated with the reaction gas utilized during its depositional process. The wear rate of amorphous carbon film decreases by 34 times compared to alumina substrate. During the dissociation of CH4 at a high hydrogen-to-carbon ratio, more hydrogen atoms are involved in the chemical reaction. The introduction of hydrogen elevates the H/E and sp(3)/sp(2) ratios within the film, thereby favoring the generation of low-friction surfaces and refining the tribological performance of alumina ceramics.