Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates

被引：1

作者：

Lin, Shih-Hung ^{[1
]}

Chang, Yung-Huang ^{[2
]}

Huang, Yu-Jie ^{[3
]}

Chen, Yuan-Tsung ^{[3
]}

Dong, Shu-Huan ^{[3
]}

机构：

[1] Natl Yunlin Univ Sci & Technol, Dept Elect Engn, 123 Univ Rd,Sect 3, Touliu 64002, Yunlin, Taiwan

[2] Natl Yunlin Univ Sci & Technol, Bachelor Program Ind Technol, 123 Univ Rd,Sect 3, Touliu 64002, Yunlin, Taiwan

[3] Natl Yunlin Univ Sci & Technol, Grad Sch Mat Sci, 123 Univ Rd,Sect 3, Touliu 64002, Yunlin, Taiwan

来源：

PROCESSES | 2024年 / 12卷 / 12期

关键词：

surface roughness; Co90Ce10 thin film; electronic property; annealing treatment; magnetic properties; optical properties; PERCENT CE ALLOY; OPTICAL-PROPERTIES; ELECTRICAL-PROPERTIES; SURFACE-ROUGHNESS; MECHANICAL-PROPERTIES; THICKNESS; CORROSION; DEPOSITION; GROWTH; ENERGY;

D O I：

10.3390/pr12122806

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

This study explores cobalt-cerium (Co90Ce10) thin films deposited on silicon (Si) (100) and glass substrates via direct current (DC) magnetron sputtering, with thicknesses from 10 nanometer (nm) to 50 nm. Post-deposition annealing treatments, conducted from 100 degrees C to 300 degrees C, resulted in significant changes in surface roughness, surface energy, and magnetic domain size, demonstrating the potential to tune magnetic properties via thermal processing. The films exhibited hydrophilic behavior, with thinner films showing a stronger substrate effect, crucial for surface engineering in device fabrication. Increased film thickness reduced transmittance due to photon signal inhibition and light scattering, important for optimizing optical devices. Furthermore, the reduction in sheet resistance and resistivity with increasing thickness and heat treatment highlights the significance of these parameters in optimizing the electrical properties for practical applications.

引用

页数：18

共 60 条

[1] Deposition of ZnO thin films with different powers using RF magnetron sputtering method: Structural, electrical and optical study [J].