Design of a high-performance surface plasmon resonance device for effective measurement of thin liquid film thickness
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作者:
Wang, Hongjian
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机构:
Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Wang, Hongjian
[1
,2
]
Lee, Hyung Ju
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机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Lee, Hyung Ju
[3
]
Jin, Jinghao
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机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Jin, Jinghao
[3
]
Koya, Alemayehu Nana
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机构:
Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Koya, Alemayehu Nana
[1
]
Choi, Chang Kyoung
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机构:
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Choi, Chang Kyoung
[4
]
Li, Longnan
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Li, Longnan
[1
]
Li, Wei
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机构:
Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Li, Wei
[1
]
Lee, Seong Hyuk
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机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
Lee, Seong Hyuk
[3
]
机构:
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, GPL Photon Lab, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
[4] Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USA
Electric field intensity;
Penetration depth;
Reflectance curve;
Surface plasmon resonance (SPR);
Thin liquid film;
DISJOINING PRESSURE;
HEAT-TRANSFER;
EVAPORATION;
FLOW;
D O I:
10.1007/s12206-024-0947-6
中图分类号:
TH [机械、仪表工业];
学科分类号:
0802 ;
摘要:
This study explores the surface plasmon resonance (SPR) and the electromagnetic field responses of multi-layer structures with incident light to enhance the sensitivity and range for measurement of nanoscale thin liquid film thickness. We assess the effect of metal layer type and its corresponding thickness on the optical responses. Notably, the silver (Ag) layer exhibits a more acute reflectance curve with a thickness of 50 nm, which is attributable to the minimization of non-radiative losses and a substantial real component of the dielectric constant of the Ag layer. Furthermore, a correlation between liquid film thickness and reflectance has been established across different metal layer types at specified thicknesses. The Ag layer demonstrates the broadest measurement range for liquid film thickness due to its extensive penetration depth into the dielectric material. Conversely, the sodium (Na) layer presents the narrowest measurement range, albeit with the highest SPR sensitivity.
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Jeong, Chan Ho
Lee, Hyung Ju
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Lee, Hyung Ju
Choi, Chang Kyoung
论文数: 0引用数: 0
h-index: 0
机构:
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Choi, Chang Kyoung
Lee, Seong Hyuk
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Chung Ang Univ, Dept Intelligent Energy & Ind, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Lee, Hyung Ju
Choi, Chang Kyoung
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Choi, Chang Kyoung
Lee, Seong Hyuk
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Lee, Hyung Ju
Choi, Chang Kyoung
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Choi, Chang Kyoung
Lee, Seong Hyuk
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Jeong, Chan Ho
Lee, Hyung Ju
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Lee, Hyung Ju
Choi, Chang Kyoung
论文数: 0引用数: 0
h-index: 0
机构:
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Choi, Chang Kyoung
Lee, Seong Hyuk
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Chung Ang Univ, Dept Intelligent Energy & Ind, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Lee, Hyung Ju
Choi, Chang Kyoung
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Choi, Chang Kyoung
Lee, Seong Hyuk
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Lee, Hyung Ju
Choi, Chang Kyoung
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Michigan Technol Univ, Mech Engn Engn Mech, Houghton, MI 49931 USAChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
Choi, Chang Kyoung
Lee, Seong Hyuk
论文数: 0引用数: 0
h-index: 0
机构:
Chung Ang Univ, Sch Mech Engn, Seoul 06974, South KoreaChung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea