Surface oxygen chemistry of metal oxide semiconductors for gas-sensing applications

被引:9
作者
Li, Jiayu [1 ]
Na, Ertai [1 ]
Liang, Xudong [1 ]
Liang, Qihua [2 ]
Fan, Meihong [3 ]
Chen, Hui [1 ]
Li, Guo-Dong [1 ]
Zou, Xiaoxin [1 ]
机构
[1] Jilin Univ, Coll Chem, State Key Lab Inorgan Synth & Preparat Chem, Changchun 130012, Peoples R China
[2] Guangxi Univ, Sch Resources Environm & Mat, Nanning 530004, Peoples R China
[3] Changchun Univ Sci & Technol, Sch Chem & Environm Engn, Changchun 130022, Peoples R China
基金
中国国家自然科学基金;
关键词
SENSOR; TEMPERATURE; PERFORMANCE; CO; FORMALDEHYDE; MECHANISM; CATALYSTS; XYLENE; FILM;
D O I
10.1039/d4qi02385d
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
With the development of science and technology, the demand for reliable and efficient gas sensors in various applications, ranging from environmental monitoring to industrial safety, is increasing. In particular, metal oxide semiconductor (MOS) based sensors have been extensively studied due to their stability, fast response, and cost-effectiveness. Given this backdrop, the paper reviews the gas-sensing mechanisms of MOS gas sensors, focusing on the role of oxygen participation. The electron depletion layer (EDL)/hole accumulation layer (HAL) theory is discussed, emphasizing the importance of chemisorbed oxygen in gas-sensing reactions. However, recent observations have challenged the conventional oxygen adsorption mechanism, suggesting the involvement of lattice oxygen under certain conditions. This review categorizes the degree of oxygen participation into three levels and analyzes existing theories and methods to enhance sensor performance. The specific scenarios of lattice oxygen participation, current understanding, and characterization methods are presented. The article concludes with future prospects and questions to guide further research in advancing MOS-based gas sensors.
引用
收藏
页码:8602 / 8626
页数:25
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