Insight into the Re-Deposition Equilibrium of Sn Contaminant on Euv Multi-Layer Mirror Surface During Hydrogen Plasma Cleaning

被引：0

作者：

Wang, Sishu ^{[1
]}

Ye, Zongbiao ^{[1
]}

Wu, Andong ^{[2
]}

Lu, Qipeng ^{[3
,4
,5
]}

Song, Yuan ^{[3
,4
,5
]}

Yu, Xingang ^{[6
]}

Wei, Jianjun ^{[7
]}

Gao, Tao ^{[7
]}

Gou, Fujun ^{[1
]}

机构：

[1] Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu,610064, China

[2] Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou,730000, China

[3] Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun,130033, China

[4] State Key Laboratory of Applied Optics, Changchun, China

[5] Key Laboratory of Optical System Advanced Manufacturing Technology, Chinese Academy of Sciences, Changchun, China

[6] School of Engineering Science, University of Chinese Academy of Science, Beijing,100049, China

[7] Institute of Atomic and Molecular Physics, Sichuan University, Chengdu,610064, China

来源：

SSRN |

关键词：

Compendex;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Adsorption

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