Insight into the Re-Deposition Equilibrium of Sn Contaminant on Euv Multi-Layer Mirror Surface During Hydrogen Plasma Cleaning

被引：0

作者：

Wang, Sishu ^{[1
]}

Ye, Zongbiao ^{[1
]}

Wu, Andong ^{[2
]}

Lu, Qipeng ^{[3
,4
,5
]}

Song, Yuan ^{[3
,4
,5
]}

Yu, Xingang ^{[6
]}

Wei, Jianjun ^{[7
]}

Gao, Tao ^{[7
]}

Gou, Fujun ^{[1
]}

机构：

[1] Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu,610064, China

[2] Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou,730000, China

[3] Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun,130033, China

[4] State Key Laboratory of Applied Optics, Changchun, China

[5] Key Laboratory of Optical System Advanced Manufacturing Technology, Chinese Academy of Sciences, Changchun, China

[6] School of Engineering Science, University of Chinese Academy of Science, Beijing,100049, China

[7] Institute of Atomic and Molecular Physics, Sichuan University, Chengdu,610064, China

来源：

SSRN |

关键词：

Compendex;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Adsorption

引用

共 3 条

[1] UWAVS first mirror after long plasma cleaning: Surface properties and material re-deposition issues
Ushakov, Andrey
Verlaan, Ad
Ebeling, Rob
Wu, Chien-Ching
O'Neill, Ray
Smith, Mark
Stratton, Brentley
Koster, Norbert
Gattuso, Anthony
Lasnier, Charles J.
Feder, Russell
Maniscalco, Matthew P.
Verhoeff, Peter
FUSION ENGINEERING AND DESIGN, 2019, 146 : 1559 - 1563
[2] Formation of graphite re-deposition layer by hydrogen RF plasma
Katayama, K
Nagase, H
Manabe, Y
Kodama, Y
Takeishi, T
Nishikawa, M
THIN SOLID FILMS, 2004, 457 (01) : 151 - 157
[3] Hydrogen retention in a tungsten re-deposition layer formed by hydrogen RF plasma
Kawasaki, T
Manabe, Y
Katayama, K
Takeishi, T
Nishikawa, M
FUSION SCIENCE AND TECHNOLOGY, 2005, 48 (01) : 581 - 584

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