Electromigration of Al-0.5 wt%Cu with Nb-based liner dual damascene interconnects

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[1] Usui, Takamasa
[2] Watanabe, Tadayoshi
[3] Hatano, Masaaki
[4] Ito, Sachiyo
[5] Wada, Junichi
[6] Kaneko, Hisashi
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Usui, T. | 1600年 / Japan Society of Applied Physics卷 / 43期
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