Preparation of SOFC grown by helicon wave excited plasma sputtering - Energy control of helicon wave excited plasma

被引：0
|
作者：
Morimoto, K. [1 ]
Okayama, H. [1 ]
Nagata, A. [1 ]
机构：
[1] Osaka Institute of Technology, Asahi-ku, Osaka 535-8585, Japan
来源：
Shinku/Journal of the Vacuum Society of Japan | 2001年 / 44卷 / 05期
关键词：
D O I：
10.3131/jvsj.44.539
中图分类号：
学科分类号：
摘要：
6
引用
收藏
页码：539 / 543
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